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A series of different discharge configurations suitable for surface treatment at atmospheric pressure is discussed, including a non-thermal modular radio frequency (13.56, 27.12 or 40.78 MHz) jet plasma. The capacitively coupled configuration allows the operation with both rare gases (e.g. Ar) and reactive gases (N 2 , air, reactive admixtures of siliconcontaining compounds). Several capillaries are arranged in an array to allow plasma assisted treatment of surfaces including non-flat geometries. Optical emission spectroscopy, mass spectrometry and measurements of the axial and radial temperature profiles are used to characterize the discharge. The surface energy of different polymer materials is significantly enhanced after plasma treatment. Many applications are possible, such as plasma activation of surfaces for adhesion control, surface cleaning, plasma enhanced CVD, plasma cleaning, plasma activation and biomedical applications.

An atmospheric plasma jet (APPJ, 27.17 MHz, Ar with 1% HMDSO) has been studied for the deposition of thin silicon-organic films. Jet geometries are attractive for local surface treatment or for conformal covering of 3D forms, e.g. inner walls of wells, trenches or cavities, because they are not confined by electrodes and their dimensions can be varied from several centimetres down to the sub-millimetre region. Deposition experiments have been performed on flat polymer and glass samples with a deposition rate of 0.25-23 nm s −1 . The knowledge of the static deposition profile of the plasma source (footprint) is essential to allow for a controlled deposition with the source moving relative to the substrate. By adjusting the plasma parameters (RF power and gas flow) to the geometry (i.e. electrode configuration, tube diameter, relative tube position, substrate distance) the footprint can be shaped from a ring form reflecting the tube dimension to a parabolic profile. Next to the conventional stochastic mode of operation we observe a characteristic locked mode-reported here for the first time for an RF-APPJ which can improve the film deposition process distinctively. The experimental results of the local film distribution agree well with an analytical model of the deposition kinetics. The film properties have been evaluated (profilometry, XPS, FT-IR spectroscopy and SEM) for different deposition conditions and substrate distance. The FT-IR spectra demonstrate dominating SiO absorption bands, thus providing an indication for the prevailing (inorganic) SiO x character of the films. HMDSO molecules disintegrate to a sufficient degree as proved by the absence of CH 2 absorption in the spectra. XPS measurements confirm the local dependence with a slightly increased organic character a few millimetres away from the maximum in the deposition profile. The substrate distance and the source direction both seem relevant and require consideration during coating of 3D objects.

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