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Plasma diagnostics were performed during excimer laser ablation of graphite in a low-pressure atmosphere using time- and space-resolved optical emission spectroscopy. The laser fluence and nitrogen pressure were set to values typically applied to pulsed laser deposition of thin films. Under these conditions, optical emission spectra were dominated by continuum emission and spectral lines from carbon ions during the early plasma phase , when the carbon vapour is located in the vicinity of the target surface, whereas molecular bands of molecules and CN radicals were essentially observed at later times when the vapour expands through the ambient gas. Emission spectra of , CN and were recorded as functions of time for various distances from the target. From computer simulations of molecular spectra, we deduced rotational and vibrational temperatures. The acquired information about the kinetics of excited plasma species and gas phase reactions contributes to a better understanding of pulsed laser deposition of carbon nitride thin films.

Extraction of negative ions from pulsed electronegative capacitively coupled plasmas J. Appl. Phys. 112, 033303 (2012) High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions J. Appl. Phys. 111, 083303 (2012) Decreasing high ion energy during transition in pulsed inductively coupled plasmas Appl. Phys. Lett. 100, 044105 (2012) Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity Appl. Phys. Lett. 99, 261501 (2011) Origin of electrical signals for plasma etching endpoint detection Time-and space-resolved emission and laser-induced fluorescence spectroscopic measurements were performed to investigate vaporization and plasma formation resulting from excimer laser irradiation of titanium targets in a low-pressure nitrogen atmosphere. Measurement series have been done by varying the laser intensity from the vaporization threshold at 25 MW crne2 up to values of about 500 MW cm-" typically applied in pulsed laser deposition processing of titanium nitride films. Thus, the transition from thermal evaporation to the high-density plasma formation process, leading to the production of reactive species and high-energy ions, was evidenced. An interesting result for the comprehension of the reactive deposition process was the observation of a quantity of dissociated and ionized nitrogen, which is transported with the plasma front in the direction of the substrate. 0 199.5 American Institute of Physics.

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