The Schottky barrier height in metal/Ge contacts shows weak dependence on the metal work function indicating strong Fermi-level pinning close to the Bardeen limit. The pinning factor S is about 0.05 and the charge neutrality level (CNL) is only about 0.09eV above the top of the valence band. Because of this, the Fermi level in Ge lies higher than CNL in most cases of interest so that unpassivated acceptorlike gap states at the interface are easily filled, building up a net negative fixed charge. This could prevent efficient inversion of a p-type Ge surface in a metal-oxide-semiconductor structure.
Ultrathin (sub-monolayer to 12 monolayers) AlN nanosheets are grown epitaxially by plasma assisted molecular beam epitaxy on Ag(111) single crystals. Electron diffraction and scanning tunneling microscopy provide evidence that AlN on Ag adopts a graphite-like hexagonal structure with a larger lattice constant compared to bulk-like wurtzite AlN. This claim is further supported by ultraviolet photoelectron spectroscopy indicating a reduced energy bandgap as expected for hexagonal AlN.
Silicene is the silicon counterpart of graphene, i.e. it consists in a single layer of Si atoms with a hexagonal arrangement. We present a review of recent theoretical and experimental works on this novel two dimensional material. We discuss first the structural, electronic and vibrational properties of free-standing silicene, as predicted from first-principles calculations. We next review theoretical studies on the interaction of silicene with different substrates. The growth and experimental characterization of silicene on Ag(1 1 1) is next discussed, providing insights into the different phases or atomic arrangements of silicene observed on this metallic surface, as well as on its electronic structure. Recent experimental findings about the likely formation of hexagonal Si nanosheets on MoS2 are also highlighted.
The electronic band structure of monolayer (4 × 4) silicene on Ag(111) is imaged by angle resolved photoelectron spectroscopy. A dominant hybrid surface metallic band is observed to be located near the bulk Ag sp-band which is also faintly visible. The two-dimensional character of the hybrid band has been distinguished against the bulk character of the Ag(111) sp-band by means of photon energy dependence experiments. The surface band exhibits a steep linear dispersion around the K¯Ag point and has a saddle point near the M¯Ag point of Ag(111) resembling the π-band dispersion in graphene.
Atomically-thin, inherently 2D semiconductors offer thickness scaling of nanoelectronic devices and excellent response to light for low-power versatile applications. Using small exfoliated flakes, advanced devices and integrated circuits have already been realized, showing great potential to impact nanoelectronics. Here, high-quality single-crystal MoSe2 is grown by molecular beam epitaxy on AlN(0001)/Si(111), showing the potential for scaling up growth to low-cost, large-area substrates for mass production. The MoSe2 layers are epitaxially aligned with the aluminum nitride (AlN) lattice, showing a uniform, smooth surface and interfaces with no reaction or intermixing, and with sufficiently high band offsets. High-quality single-layer MoSe2 is obtained, with a direct gap evidenced by angle-resolved photoemission spectroscopy and further confirmed by Raman and intense room temperature photoluminescence. The successful growth of high-quality MoSe2/Bi2Se3 multilayers on AlN shows promise for novel devices exploiting the non-trivial topological properties of Bi2Se3.
Germanium metal-insulator-semiconductor capacitors with La2O3 dielectrics deposited at high temperature or subjected to post deposition annealing show good electrical characteristics, especially low density of interface states Dit in the 1011eV−1cm−2 range, which is an indication of good passivating properties. However, the κ value is estimated to be only about 9, while there is no evidence for an interfacial layer. This is explained in terms of a spontaneous and strong reaction between La2O3 and Ge substrate to form a low κ and leaky La–Ge–O germanate over the entire film thickness, which, however, raises concerns about gate scalability. Combining a thin (∼1nm) La2O3 layer with thicker HfO2 degrades the electrical characteristics, including Dit, but improves gate leakage and equivalent oxide thickness, indicating a better potential for scaling. Identifying suitable gate dielectric stack which combines good passivating/interfacial properties with good scalability remains a challenge.
Single and few layers of the two-dimensional (2D) semimetal ZrTe are grown by molecular beam epitaxy on InAs(111)/Si(111) substrates. Excellent rotational commensurability, van der Waals gap at the interface and moiré pattern are observed indicating good registry between the ZrTe epilayer and the substrate through weak van der Waals forces. The electronic band structure imaged by angle resolved photoelectron spectroscopy shows that valence and conduction bands cross at the Fermi level exhibiting abrupt linear dispersions. The latter indicates massless Dirac Fermions which are maintained down to the 2D limit suggesting that single-layer ZrTe could be considered as the electronic analogue of graphene.
Thin insulator films of the high-κ dielectric HfO2 are deposited on Ge(100) substrates by evaporating Hf in atomic oxygen beams after in situ thermal desorption of the native oxide in ultrahigh vacuum and subsequent treatment of the clean Ge surface in oxygen and nitrogen. It is shown that HfO2 forms atomically sharp interfaces with Ge and behaves as an excellent insulator with dielectric permittivity κ∼25, which is close to the expected bulk value. Very low equivalent oxide thickness of 0.75 (±0.1) nm with a low gate leakage current of ∼4.5×10−4A∕cm2 at 1 V in accumulation is achieved. Strong frequency dispersion of the inversion capacitance and low frequency behavior of the high frequency capacitance–voltage curves is observed. This is attributed to a combined effect of a high generation rate of minority carriers due to impurity traps and the high intrinsic carrier concentration in Ge, which result in a short minority carrier response time.
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