Trap generation in amorphous SiO2 films with thickness about 500 Α was studied by nonavalanche injection of hot electrons. The trap density, the electron capture cross-section of native and generated traps and the effective trap generation constant for the oxide fields of 1-4 MV/cm, injected charge density up to 3 x 10 19 e/cm -2 and injected current density in the range 2-300 µA/cm2 were determined and discussed.
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