In x Al 1 − x N films were heteroepitaxially grown on AlN∕Al2O3 (0001) templates by molecular beam epitaxy. The compositions studied spanned the whole ternary range. The complex dielectric function of the films was investigated by variable angle spectroscopic ellipsometry in the energy range from 0.55to6eV. The energy bandgap bowing parameter was found to strongly depend on composition, monotonically increasing with decreasing InN mole fraction. This behavior is in agreement with theoretical predictions of large charge transfer contributions to bandgap bowing.

A mechanism for compositional modulations in InxAl1−xN films is described which considers growth kinetics during molecular beam epitaxy. InAlN crystalline films with various indium contents, grown on GaN or AlN buffer layers to create a variation in lattice mismatch conditions, were studied by transmission electron microscopy. Films comprise of columnar domains which are observed regardless of mismatch, with increasing indium concentration toward domain edges. We propose that indium is incorporated preferentially between adjacent dynamical InAlN platelets, owing to tensile strain generated upon platelet coalescence. The resulting In-rich boundaries are potential minima for further indium adatoms, creating a permanent indium composition gradient.