Abstract:The field-emission properties of field electron sources produced using the atomic structure of silicon crystals, the heterophase vacuum-plasma self-organization of island carbon coatings, and highly anisotropic plasma-chemical etching under weak-adsorption conditions are studied. A correlation between the morphological and field-emission characteristics of field cathode microstructures on silicon crystals with various conductivity types is ascertained. The results of experimental studies are interpreted using … Show more
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