Изменение характера биаксиальных напряжений при возрастании x от 0 до 0.7 в слоях Al-=SUB=-x-=/SUB=-Ga-=SUB=-1-x-=/SUB=-N:Si, полученных методом аммиачной молекулярно-лучевой эпитаксии
Abstract:The deformation mode and defect structure of Al_ x Ga_1 – x N:Si epitaxial layers ( x = 0–0.7) grown by molecular beam epitaxy and doped with Si under a constant silane flux are studied by X-ray diffractometry. The concentration of Si atoms in the layers measured by secondary ion mass spectrometry is (4.0–8.0) × 10^19 cm^–3. It is found that the lateral residual stresses are compressive at x < 0.4 and become tensile at x > 0.4. The stresses after the end of growth are estimated and the contribution to th… Show more
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