Адгезия на границе раздела Ta(Mo)/NiTi

Abstract

The atomic and electronic structure of the Ме(110)/NiTi(110) and TiO2(100)/Me(110) interfaces, where Me = Ta, Mo was investigated by the projected augmented-waves method within the density functional theory. It has been shown that the formation of intermediate oxide layers at the metal–alloy interface leads to adhesion decrease.