2022
DOI: 10.1007/s43673-021-00033-0
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β-Ga2O3 material properties, growth technologies, and devices: a review

Abstract: Rapid progress in β-gallium oxide (β-Ga2O3) material and device technologies has been made in this decade, and its superior material properties based on the very large bandgap of over 4.5 eV have been attracting much attention. β-Ga2O3 appears particularly promising for power switching device applications because of its extremely large breakdown electric field and availability of large-diameter, high-quality wafers manufactured from melt-grown bulk single crystals. In this review, after introducing material pr… Show more

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Cited by 91 publications
(60 citation statements)
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“…Most Ga 2 O 3 /GaN heterointerfaces were developed by depositing Ga 2 O 3 on the GaN surface utilizing numerous techniques such as metalorganic chemical vapour deposition (MOCVD), sputtering, thermal oxidation, and pulse laser deposition. , Among various approaches, MOCVD has the demerit of using hazardous precursors that restrict the feasibility of mass production . Also, while depositing the film using sputtering and pulsed laser deposition (PLD), the substrate surface preparation may be critical in determining the adhesion; the setup cost is also very high. , On the other hand, thermal oxidation is a simple and convenient method for creating oxides directly on the substrate.…”
Section: Introductionmentioning
confidence: 99%
“…Most Ga 2 O 3 /GaN heterointerfaces were developed by depositing Ga 2 O 3 on the GaN surface utilizing numerous techniques such as metalorganic chemical vapour deposition (MOCVD), sputtering, thermal oxidation, and pulse laser deposition. , Among various approaches, MOCVD has the demerit of using hazardous precursors that restrict the feasibility of mass production . Also, while depositing the film using sputtering and pulsed laser deposition (PLD), the substrate surface preparation may be critical in determining the adhesion; the setup cost is also very high. , On the other hand, thermal oxidation is a simple and convenient method for creating oxides directly on the substrate.…”
Section: Introductionmentioning
confidence: 99%
“…However, β-Ga 2 O 3 grown by MBE is reported to exhibit an unintentional background doping density on the order of %10 16 cm À3 . [74,75] It is challenging to achieve low doping density with MBE, because the background O species easily oxidize the dopant source surface, making nonuniform dopant flux. MBE epitaxial growth of β-Ga 2 O 3 was first performed on (100) cleavage plane, because it has weak ionic bonds, which promotes diffusion of adatoms, thereby enhancing the growth rate supposedly.…”
Section: Molecular Beam Epitaxy and Halide Vapor-phase Epitaxymentioning
confidence: 99%
“…Gallium oxide is a promising wide-bandgap semiconductor [1]. In the last few years, interest to the study of this material has significantly grown [2]. This interest can be explained by the broad scope of application of gallium oxide in various optoelectronic devices [2][3][4][5][6].…”
Section: Introductionmentioning
confidence: 99%