2022
DOI: 10.1021/acsami.1c21845
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α-Gallium Oxide Films on Microcavity-Embedded Sapphire Substrates Grown by Mist Chemical Vapor Deposition for High-Breakdown Voltage Schottky Diodes

Abstract: α-Gallium oxide, with its large band gap energy, is a promising material for utilization in power devices. Sapphire, which has the same crystal structure as α-Ga 2 O 3 , has been used as a substrate for α-Ga 2 O 3 epitaxial growth. However, lattice and thermal expansion coefficient mismatches generate a high density of threading dislocations (TDs) and cracks in films. Here, we demonstrated the growth of α-Ga 2 O 3 films with reduced TD density and residual stress on microcavity-embedded sapphire substrates (ME… Show more

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Cited by 19 publications
(9 citation statements)
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“…This is a low scale technique, which is done in ambient conditions. It is an easier technique and it has often been reported regarding α-Ga 2 O 3 structure [53,125,126]. There have been several authors who have used this for beta gallium oxide growth as well [127,128].…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…This is a low scale technique, which is done in ambient conditions. It is an easier technique and it has often been reported regarding α-Ga 2 O 3 structure [53,125,126]. There have been several authors who have used this for beta gallium oxide growth as well [127,128].…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…In κ-Ga2O3, the orthorhombic domains are rotated 120° against each other forming a pseudo-hexagonal structure and often called ε-Ga2O3 [8], thus, ε-Ga2O3 and κ-Ga2O3 terms are used interchangeably to refer to orthorhombic Ga2O3 in literature. The fabrication and operation of Schottky diodes and MESFETs were also demonstrated with α-Ga2O3 and ε-Ga2O3 [9]- [11]. However, the metastable αand ε-Ga2O3 phases convert to more stable β-Ga2O3 at high temperatures [12].…”
Section: Introductionmentioning
confidence: 98%
“…Therefore, bulk single crystals may be produced by melt growth techniques such as Czochralski (CZ), floating zone (FZ), vertical Bridgman, and edge-defined film-fed growth (EFG), which paves the way to production of high-quality substrates as well as to homoepitaxy. Many growth methods are available for epitaxial growth of Ga 2 O 3 polymorphs such as metal–organic chemical vapor deposition (MOCVD), , magnetron sputtering, , mist-chemical vapor deposition (Mist-CVD), , atomic layer deposition (ALD), , pulsed laser deposition (PLD), halide vapor phase epitaxy, and molecular beam epitaxy (MBE). , In spite of the numerous merits of the β-Ga 2 O 3 , there are concerns regarding its anisotropic thermal conductivity and easiness of cleavage. ,, κ-Ga 2 O 3 is the second most stable polymorph, and its orthorhombic cell has higher symmetry with respect to the monoclinic one, which may lead to easier epitaxial growth and novel heterostructures. , Furthermore, it exhibits a spontaneous polarization along the [001] direction of the orthorhombic cell that could help to obtain high-density two-dimensional electron gases (2DEG) at the interface of κ-Ga 2 O 3 based heterostructures, , and thus a conducting channel for high-mobility field effect transistors, which is becoming one of the most intriguing topics of the literature on Ga 2 O 3 . Recently, κ-Ga 2 O 3 , was employed for fabrication of planar diodes and solar-blind UV–C photodetectors .…”
Section: Introductionmentioning
confidence: 99%