Zone plates for hard X-rays fabricated with the SPCVD technology

Artyukov, I. A.; Bukreeva, Inna; Chernov, V. A.; Feshchenko, R. M.; Golant, K. M.; Jark, W.; Lavrishchev, S. V.; Mitrofanov, A. V.; Popov, A.; Виноградов, А. В.

doi:10.1016/j.nima.2008.12.161

Cited by 7 publications

(4 citation statements)

References 12 publications

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“…Multilagenbeschichtungen mittels plasmagestützter chemischer Gasphasenabscheidung (engl. surface-plasma chemical vapor deposition, SPCVD) führten aufgrund der sehr hohen Depositionsraten dagegen noch zu keinen Zonenbreiten unterhalb von 100 nm [113] und können daher eher als preiswerte Kondensorlinsen für harte Röntgenstrahlung gesehen werden [114].…”

Section: Fabrikation Von Zonenplattenunclassified

Multilagenzonenplatten für die Mikroskopie mit harter Röntgenstrahlung

Eberl¹

2016

Göttingen Series in X-Ray Physics

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Section: Fabrikation Von Zonenplattenunclassified

Multilagenzonenplatten für die Mikroskopie mit harter Röntgenstrahlung

Eberl¹

2016

Göttingen Series in X-Ray Physics

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“…The ML-FZPs are fabricated via a bottom-up film growth approach. In the process a cylindrical core is coated with two alternating materials using sputtering [25,26,29], pulsed laser [30], chemical vapor [31,32] or atomic layer deposition (ALD) [28]. The resulting multilayer is sliced and polished to deliver the ML-FZPs.…”

Section: Introductionmentioning

confidence: 99%

Overview of the multilayer-Fresnel zone plate and the kinoform lens development at MPI for intelligent systems

et al. 2015

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The ultimate goal of our research is to develop novel fabrication methods for high efficiency and high resolution X-ray optics. To this end, we have been pursuing the fabrication of several innovative diffractive/refractive optics designs. One such optic is the multilayer type Fresnel zone plate (ML-FZP). Our fabrication process relies on the atomic layer deposition (ALD) of two materials on a smooth glass fiber followed by a focused ion beam (FIB) based slicing and polishing. The ALD process allows much smaller outermost zone widths than the standard electron beam lithography based FZPs, meaning FZPs with potentially higher resolutions. Moreover, by depositing the multilayer on a cm long glass-fiber FZPs with very high optical thicknesses can be fabricated that can efficiently focus harder X-rays as well. A 21 nm half-pitch resolution was achieved using the ML-FZPs. Another optic we have been working on is the kinoform lens, which is a refractive/diffractive optic with a 100 % theoretical focusing efficiency. Their fabrication is usually realized by using approximate models which limit their success. Recently the fabrication of real kinoform lenses has been successfully realized in our lab via gray-scale direct-write ion beam lithography without any approximations. The lenses have been tested in the soft X-ray range achieving up to ~90 % of the calculated efficiency which indicates outstanding replication of the designed profile. Here we give an overview of our research and discuss the future challenges and opportunities for these optics.

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“…Therefore, considerable effort has been exerted to fabricate hard X-ray FZPs with demonstrably higher efficiency. For example, researchers have designed deposition techniques to grow zone structures by sputtering (Kamijo et al, 2003;Tamura et al, 2006) or chemical vapor deposition (Golant et al, 2007;Artyukov et al, 2009).…”

Section: Introductionmentioning

confidence: 99%

Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

Lee

Cho

Kim

et al. 2010

J Synchrotron Radiat

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Focused hard X-ray microbeams for use in X-ray nanolithography have been investigated. A 7.5 keV X-ray beam generated at an undulator was focused to about 3 µm using a Fresnel zone plate fabricated on silicon. The focused X-ray beam retains a high degree of collimation owing to the long focal length of the zone plate, which greatly facilitates hard X-ray nanoscale lithography. The focused X-ray microbeam was successfully utilized to fabricate patterns with features as small as 100 nm on a photoresist.

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Zone plates for hard X-rays fabricated with the SPCVD technology

Cited by 7 publications

References 12 publications

Multilagenzonenplatten für die Mikroskopie mit harter Röntgenstrahlung

Multilagenzonenplatten für die Mikroskopie mit harter Röntgenstrahlung

Overview of the multilayer-Fresnel zone plate and the kinoform lens development at MPI for intelligent systems

Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

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