ZnO thin films grown at different plasma energies by the laser ablation of metallic Zn with a 532 nm wavelength

Abstract

In this work, structural, optical and electrical properties of ZnO thin films grown by laser ablation of a Zn metallic target on oxygen atmosphere using the 532 nm emission of the second harmonic of a Nd: YAG laser, are studied. Different mean kinetic energies of the plasma (E k ) at fixed ion density (N p ) were used as control parameters. X-ray diffraction profiles show the presence of a width (002) peak together with a peak associated with the (101) reflection. Changes in E k affect the crystallinity of the samples. An intense PL emission in the visible range of the spectra associated with a majority intrinsic donor defects can be observed. The films showed an unusual low electrical resistivity as compared to the commonly reported values for undoped ZnO thin films.

Influence of plasma kinetic energy during the pulsed laser deposition of borophene films on silicon (100)

“…The PLD processes were controlled by time of flight (TOF) curves obtained by Langmuir-Planar-Probe and one oscilloscope, where the area under the curves was used to estimate the KE; for details of this method, see ref. 29 . Prior to each experiment, the TOF signal was measured by placing the probe at the exact position of the substrate using a substrate and probe holder attached to a rotational motion stage and a mask.…”

“…The mean kinetic energy of the arriving ionized species highly influences the growing film properties. 29 Fig. 2 shows the Time of Flight (TOF) curves used to control the KE and deposition processes for each boron film.…”

Effect of the thickness on the photocatalytic and the photocurrent properties of ZnO films deposited by spray pyrolysis

“…The existing ZnO thin films have been fabricated by various deposition techniques such as spin coating, dip coating, spray pyrolysis, ultrasonic spray pyrolysis, sputtering, pulsed laser deposition, hydrothermal method, electrochemical deposition, etc. [9][10][11][12][13]. Among these, the ultrasonic spray pyrolysis technique can be seen as a low-cost as well as an effective technique for the fabrication of uniform and large-area film coatings with minimal chemical wastage [11,14].…”

Effect of oxygen pressure on stoichiometric transfer in laser ablation of Pr3+ doped Gd2O3–Ga2O3 binary system

“…8 For example, the reaction of the ablated species of the plasma plume with oxygen or nitrogen ambient atmosphere during the plasma plume expansion leads to a very suitable variation of this technique, called reactive-PLD, for the fabrication of oxide and nitride thin films, respectively. Reactive-PLD has been successfully applied to fabricate thin films of oxides such as TiO 2 , 9,10 Y 2 O 3 , 11 Al 2 O 3 , 12 ZnO, 13,14 Ga 2 O 3 , 15 and nitrides such as CN x , AlN, TiN, BN, and GaN (see, for example, the review 16 ). Unfortunately, in some cases, the composition of the films grown by the PLD process could be changed dramatically and unfavorably by many different mechanisms.…”