ZnO Thin Films: Fabrication Routes, and Applications

Abstract

Thin films have become a hot topic in the field of nanotechnology. Due to their optical and electrical characteristics, thin-film semiconductor oxides are among the semiconductor oxides with the greatest range of applications. The most popular semiconductor component is zinc oxide (ZnO). ZnO, a wide bandgap semiconductor (Eg = 3.37 eV at room temperature), have been widely used in electronic, optoelectronic, and information technology device platforms. Nano-ZnO thin films have a wide range of applications due to their remarkable properties. There are several methods for developing a thin layer of the ZnO nanomaterial. Sputtering, chemical vapor deposition (CVD), molecular beam epitaxy, pulsed laser deposition (PLD), and spray pyrolysis are among these methods. Although sputtering is the most commonly used method for high-quality applications, chemical vapor deposition and spray pyrolysis are also popular due to their low cost and ease of use. This chapter provides a brief overview of the various fabrication routes, characterization techniques, and applications of ZnO thin films, allowing us to investigate the chemical, structural, optical, and electrical properties of ZnO thin films, as well as their various applications.