Zn Ion Post-Implantation-Driven Synthesis of CuZn Alloy Nanoparticles in Cu-Preimplanted Silica and Their Thermal Evolution

Abstract

Cu nanoparticles (NPs) were fabricated in silica by 45 keV Cu ion implantation at a fluence of 1.0 × 10(17) cm(-2) and were then subjected to implantation of 50 keV Zn ions at fluences of 1.0 × 10(16), 5.0 × 10(16), and 10.0 × 10(16) cm(-2), respectively. Our results clearly show that post Zn ion implantation could significantly modify structures and components of the preformed Cu NPs and thus the corresponding surface plasmon resonance (SPR) absorption can be modulated in a wide range. In particular, CuZn alloy NPs with unique SPR absorption were synthesized in Cu-implanted silica followed by Zn ion implantation at a fluence of 5.0 × 10(16) cm(-2). During subsequent annealing, two distinguished processes concerning CuZn alloy NPs (i.e., realloying and dealloying) were found that directly result from thermally driven diffusion of Zn atoms. Moreover, owing to Zn diffusion, lots of core-shell nanostructures consisting of Zn-related compound shells around Cu cores were observed after annealing at 500 °C and higher. The underlying mechanism concerning the formation and decomposition of CuZn alloy NPs is discussed and presented.

Growth of rutile TiO2nanorods in Ti and Cu ion sequentially implanted SiO2and the involved mechanisms

“…In addition, one also can find that a weak absorption peak occurs at about 575 nm in the N 2 -annealed sample, which could be attributed to the Cu SPR peak, indicating formation of Cu NPs in the substrate. Indeed, formation of Cu NPs has been found for high fluence Cu implantation into SiO 2 substrate [22,23]. The enhanced absorption of the N 2 -annealed Ti +3Cu sample in visible region is most probably related to the formation of oxygen vacancies in the formed nanorods owing to annealing in low oxygen partial pressure, as well as Cu doping in the nanorods.…”

“…However, such wet chemical-based nanostructures are hardly fixed on optoelectronic devices and easy to fall off from the substrates. Ion implantation, as a powerful nanofabrication method, could overcome these difficulties owing to the fact that the nanomaterials fabricated by ion implantation are usually embedded in the substrates [16][17][18][19][20][21][22][23][24][25]. The compatibility of nanomaterials with the optoelectronic devices can make the ion implantation technology easy to be industrialized.…”

“…The compatibility of nanomaterials with the optoelectronic devices can make the ion implantation technology easy to be industrialized. Moreover, it has also been demonstrated that sequential implantation of different metallic ions into dielectrics could significantly modify the structures, shape and spatial distribution of the formed nanostructures, and thus largely modulate the relevant optical properties [19,[22][23][24][25]. Our earlier researches [22,26] have demonstrated that pre-implantation of Ti and Zn ions at low fluence could largely enhance surface plasmon resonance absorption (SPR) related to Cu NPs due to formation of NPs with Cu core-Ti related compounds shell or Cu core-Zn related compounds shell after annealing.…”

Plasmonic Nanoparticles in Dielectrics Synthesized by Ion Beams: Optical Properties and Photonic Applications

“…[ 103 ] Recently, a number of literature have been published on the formation of hollow NPs and synthesis of core–shell NPs by one‐ or two‐step ion implantation. [ 104,106–118 ] In addition, specific nuclei‐shell structures such as multilayer NPs can also be synthesized by ion implantation in the simple operating steps. Ren et al performed the fabrication of sandwiched structure of NPs (i.e., Ag shell–nanovoid‐Ag core NPs) by one‐step ion implantation with Ag fluence as high as 2 × 10 17 ions cm −2 , as depicted in Figure .…”

Effect of dual implantation with Ag and Ni ions on the optical absorption of silica glass

“…There are a lot of reports that observe the SPR peaks of synthesized nanoparticles by the single ion implantation. A lot of experiments using dual beam implantation have also been performed so far [9][10][11][12]. To synthesize composite nanoparticles, Shen et al performed the dual beam implantation with low energy (60-70 keV) Ni and Ag ions and the subsequent annealing at elevated temperature [13].…”