2006
DOI: 10.1016/j.jcrysgro.2006.09.028
|View full text |Cite
|
Sign up to set email alerts
|

Zn diffusion behavior at the InGaAsP/InP heterointerface grown using MOCVD

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
7
0

Year Published

2008
2008
2021
2021

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 10 publications
(7 citation statements)
references
References 7 publications
0
7
0
Order By: Relevance
“…The performance of any semiconductor devices significantly depends on the surface morphology, impurity in surface and interface, and abruptness of the interface . Secondary ion mass spectroscopy (SIMS) gives excellent information about of alloy composition, atomic homogeneity and interface characteristics of grown layers with its depth profile measurements capability in ppm range …”
Section: Introductionmentioning
confidence: 99%
“…The performance of any semiconductor devices significantly depends on the surface morphology, impurity in surface and interface, and abruptness of the interface . Secondary ion mass spectroscopy (SIMS) gives excellent information about of alloy composition, atomic homogeneity and interface characteristics of grown layers with its depth profile measurements capability in ppm range …”
Section: Introductionmentioning
confidence: 99%
“…An interstitial Zn atom diffuses quickly until it is trapped by a group III vacancy and thus incorporated as a substitutional Zn atom, which is much less mobile. The high diffusivity of Zn interstitials was confirmed by the observation of double diffusion front in InP [4], and they were considered to be the major diffusion source [5]. If the creation of Zn interstitials can be minimized, an abrupt doping profile with minimized Zn diffusion is expected.…”
Section: Introductionmentioning
confidence: 94%
“…Layers with a higher phosphide content are more strongly affected by this process. 39 Therefore, if the growth direction is reversed and the GaInP junction is grown last, the detrimental effect of the temperature-induced diffusion processes is less severe.…”
Section: Comparison Between Upright and Inverted Grown Solar Cellsmentioning
confidence: 99%