Abstract:To prevent catastrophic failures during wafer manufacturing, mask manufacturers employ sophisticated reticle inspection systems to examine every image on every reticle to identify defects. These advanced systems inspect at resolutions typically 3x higher at the reticle-plane than advanced wafer scanners; thus enabling them to detect the small defects necessary to ensure reticle quality.The most thorough inspection is done using a reticle-to-database comparison that ensures the reticle pattern matches the desig… Show more
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