YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production

Kim, Jang-Sun; Byun, Jin-Moo; Lancee, Remco J.; Hwang, Jisung; Ha, Hyeon-Jun; Hu, Kwang Young; Jeon, Se-Ra; Jang, WonJae; Son, Hyung-Sub; Meijden, Vidar van der; Noot, Marc; Foltynski, Bartosz; Macht, L.; Grzela, Grzegorz; Grouwstra, Cedric

doi:10.1117/12.2514931

Cited by 1 publication

(1 citation statement)

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“…Among various OCD measurement methods, micro-ellipsometry is a promising OCD technique as it enables massive angular measurements and small-spot illumination. Various micro-ellipsometry techniques have been studied by global research centers 7,8 and global metrology and inspection companies including KLA, ASML, and Onto Innovation [9][10][11][12][13][14][15][16] . We also have recently proposed interferometric micro-ellipsometry, named self-interference pupil ellipsometry (SIPE) 17,18 .…”

Section: Introductionmentioning

confidence: 99%

Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry

Lee

Park

Lee

et al. 2023

Optical Measurement Systems for Industrial Inspection XIII

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To achieve high accuracy and precision in optical metrology for advanced semiconductors, it is crucial to identify and compensate for errors from optical components and environmental perturbations. In this study, we investigated the sources of the errors in the interferometric ellipsometer developed for next-generation OCD. The objective lens and beam splitters, the critical optical components of the system, are intensively investigated. The system errors induced by temperature fluctuation, wavelength inaccuracy, and defocus were quantitatively examined. We also proposed methods for compensating individual errors and analyzed the effect of the compensation. As a result of error compensation, the accuracy and precision of the system is improved by 6.9 times and 2.3 times, respectively. Although the investigation was conducted based on our interferometric ellipsometry system, the finding is not limited to this system, as these errors are commonly found in most optical metrology systems. The proposed method for error compensation will be essential strategies for various ellipsometry systems suffering from a low level of accuracy and precision.

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