Y shape gate formation in single layer of ZEP520A using 3D electron beam lithography

Shao, Jinhai; Zhang, Sichao; Liu, Jianpeng; Lu, Bing-Rui; Taksatorn, Nit; Lu, Wu; Chen, Yifang

doi:10.1016/j.mee.2015.03.020

Cited by 10 publications

(4 citation statements)

References 7 publications

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“…In this study, the effect of initial molecular weight distribution on the pattern formation of main-chain-scission-type resists was investigated for the ZEP series of Zeon. The ZEP series are EB resists widely used in nanofabrication [19][20][21][22][23][24][25] and consist of methyl α-chloroacrylate and α-methylstyrene. 26) It has been reported that the ZEP series sufficiently irradiated by EB dissolves with Case II diffusion.…”

Section: Introductionmentioning

confidence: 99%

Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists

Nakajima

Hoshino²,

Kozawa

2021

Jpn. J. Appl. Phys.

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Recently, main-chain-scission-type resists have attracted considerable interest because of their highly resolving properties. In this study, the effect of initial molecular weight distribution on the pattern formation of main-chain-scission-type resists was investigated. The main-chain-scission-type resists with different molecular weight distributions were prepared by blending ZEP520A (M w, 56,000; M w/M n: 2.2) and ZEP7000 (M w, 412 000; M w/M n, 2.6) of Zeon. Independently of their initial molecular weight distribution, the molecular weight distributions of the resists become similar through the random main-chain scission. However, the initial molecular weight distribution affected the formation of boundaries between lines and spaces. When their weight ratio was 1:1, the bridges formed by pattern collapse or transient swelling were clearly observed at an irradiation dose lower than those in the case of the other weight ratios.

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Section: Introductionmentioning

confidence: 99%

Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists

Nakajima

Hoshino²,

Kozawa

2021

Jpn. J. Appl. Phys.

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“…In the end, a 500 nm thick UVIII, which is chemically amplified resist (CAR) delivered by Shipley Ltd., is spin coated and subsequently baked on a hot plate at 130°C for 1 min. As a positive tone CAR, UVIII is widely used for electron beam lithography due to its high sensitive capability and nanoscale capability [9]. The thin aluminum layer between the PMMA bilayer and UVIII layer facilitates the removal of the UVIII scum caused by heavy dose of e-beam exposure [10].…”

Section: Introductionmentioning

confidence: 99%

Nanofabrication of air-spaced field-plate gates with ultra-short footprint

Shao

Liu

et al. 2015

Microelectronic Engineering

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“…The ZEP series are EB resists widely used in nanofabrication. [13][14][15][16][17][18][19] It is also important to understand the process of dissolution of resist polymers from the resist films on which complicated patterns are drawn. However, it is difficult to observe and analyze the swelling layers of resist films consisting of areas with different solubilities.…”

mentioning

confidence: 99%

Dissolution kinetics of main-chain-scission-type resist in organic developers

Nakajima¹,

Matsuo²,

Kozawa³

2021

Appl. Phys. Express

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Main-chain-scission-type resists have been widely used for the fabrication of nanodevices. A copolymer consisting of methyl α-chloroacrylate and α-methylstyrene, known as the ZEP series of ZEON, is a popular main-chain-scission-type positive-tone resist. In this study, the dissolution kinetics were investigated using the ZEP series to clarify the effects of the molecular weight distribution and developer on the dissolution kinetics of the main-chain-scission-type resist. The thickness of the transiently swelling layer in hexyl acetate development was less than that in pentyl acetate development. The thickness of the transiently swelling layer depended on the molecular weight distribution of resist polymers.

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Y shape gate formation in single layer of ZEP520A using 3D electron beam lithography

Cited by 10 publications

References 7 publications

Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists

Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists

Nanofabrication of air-spaced field-plate gates with ultra-short footprint

Dissolution kinetics of main-chain-scission-type resist in organic developers

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