XPS determination of the binding energies of phosphorus and nitrogen in phosphazenes

Vassileva, Paunka; Krastev, V.; Lakov, L.; Peshev, O.

doi:10.1023/b:jmsc.0000025859.82714.4a

Cited by 40 publications

(23 citation statements)

References 9 publications

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“…4. Table 1 clearly indicate that XPS bands are highly influenced by the powder surface treatment history, and the observed binding energy value for each element is in agreement with the literature reports (Perrem et al, 1997;Vassileva et al, 2004;Wang & Sherwood, 2002). The O 1s profiles (Figure 5a), are due to the surface hydroxyl groups in the case of the non treated powder (A-AlN) and to the overlapping contribution of oxygen from H 2 PO 4 1-in the case of treated powder (T-AlN) and treated after 72 h immersion in water (T-AlN-72 h) or of the hydroxyl groups from Al(OH) 3 in the case of the non treated AlN powder immersed in water (A-AlN-72 h).…”

Section: Stability Of Aln Powders Against Hydrolysissupporting

confidence: 89%

Last Advances in Aqueous Processing of Aluminium Nitride (AlN) - A Review

Olhero¹,

Alves²,

Ferreira³

2011

Advances in Ceramics - Synthesis and Characterization, Processing and Specific Applications

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Section: Stability Of Aln Powders Against Hydrolysissupporting

confidence: 89%

Last Advances in Aqueous Processing of Aluminium Nitride (AlN) - A Review

Olhero¹,

Alves²,

Ferreira³

2011

Advances in Ceramics - Synthesis and Characterization, Processing and Specific Applications

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“…XPS of POMs 3 and 4 showed W in the 6+ oxidation state with both W 4f 7/2 binding energies at 35.3 eV . All four POMs contained P and V in the 5+ oxidation state as indicated by binding energies of 133.5 (±0.2) and 517 eV (±0.5), respectively …”

Section: Resultsmentioning

confidence: 94%

Polyoxometalate Complexes as Precursors to Vanadium‐Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol‐Assisted Chemical Vapour Deposition

et al. 2016

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Aerosol‐assisted chemical vapour deposition of substituted polyoxometalates H4[PMo11VO40], H7[PMo8V4O40], [nBu4N]4[PVW11O40] and [nBu4N]5[PV2W10O40] resulted in the formation of vanadium‐doped metal oxide thin films. Depositions were carried out at 550 °C in methanol or acetonitrile for the POMs that contained molybdenum or tungsten, respectively. The as‐deposited films were X‐ray amorphous and relatively non‐adherent. However, on annealing in air at 600 °C, decolourised translucent films that were more mechanically robust were obtained. Films deposited from H4[PMo11VO40] and H7[PMo8V4O40] consisted of V‐doped MoO3 in the orthorhombic phase and films from [nBu4N]4[PVW11O40] and [nBu4N]5[PV2W10O40] comprised of monoclinic V‐doped WO3. All films were fully characterised by using X‐ray photoelectron spectroscopy, energy‐dispersive X‐ray diffraction, scanning electron microscopy and UV/Vis spectroscopy.

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“…Table 4 reports the BEs and FWHM for P, N and Cl peaks. The P 2p BE value at about 133.7 eV, lower than that of the pure HCCP trimer (134.5 eV), [29,30] could indicate the vicinal presence of substitutional oxygen in phosphorus to form a P-O bond. [30] The N 1s peak profile analysis reveals (Fig.…”

Section: Resultsmentioning

confidence: 99%

Surface functionalization with phosphazene substrates—part VII. Silicon‐based materials functionalized with hexachlorocyclophosphazene

Boscoletto

Gleria²,

Milani³

et al. 2008

Surface & Interface Analysis

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This paper investigates by means of XPS analysis the surface functionalization of soda-lime and fused quartz glass substrates with hexachlorocyclophosphazene (HCCP), obtained by simple immersion in solutions of phosphazene in anhydrous solvents. Several experimental parameters like reaction solvent, temperature and treatment duration were studied, together with the influence of physisorbed water on the surface of the substrates. Phosphazene-derived deposits resistant to tetrahydrofuran (THF) washing and vacuum drying were obtained. They presented P : N : Cl stoichiometric ratios close to 1 : 1 : 1 when the reaction and the final drying of the samples were performed at room temperature; use of higher temperatures resulted in lower nitrogen and chlorine content. The chemical nature of the films was studied by XPS peaks deconvolution which enabled us to propose a possible, temperature-enhanced hydrolytical degradation mechanism.

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XPS determination of the binding energies of phosphorus and nitrogen in phosphazenes

Cited by 40 publications

References 9 publications

Last Advances in Aqueous Processing of Aluminium Nitride (AlN) - A Review

Last Advances in Aqueous Processing of Aluminium Nitride (AlN) - A Review

Polyoxometalate Complexes as Precursors to Vanadium‐Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol‐Assisted Chemical Vapour Deposition

Surface functionalization with phosphazene substrates—part VII. Silicon‐based materials functionalized with hexachlorocyclophosphazene

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