2007
DOI: 10.1557/proc-0996-h01-04
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XPS and STM Studies on Initial Oxidation of Si(110)-16x2

Abstract: The initial oxidation of Si(110)-16×2 clean surface has been investigated by using realtime synchrotron-radiation photoemission spectroscopy and scanning tunneling microscopy. The Si(110) initial oxidation is characterized by its unique rapid oxidation right after the introduction of oxygen molecules, which is most likely attributed to the preferential reactions at the pentagon pairs of the 16×2 reconstruction.

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Cited by 2 publications
(2 citation statements)
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“…These sites are somehow related to the 16 Â 2 reconstruction of Si(110) clean surface, which is consistent with our recent Si 2p XPS measurement. 23)…”
Section: Discussionmentioning
confidence: 99%
“…These sites are somehow related to the 16 Â 2 reconstruction of Si(110) clean surface, which is consistent with our recent Si 2p XPS measurement. 23)…”
Section: Discussionmentioning
confidence: 99%
“…The rapid initial oxidation was found experimentally by observing O1s photoemission spectra with synchrotron radiation [15,16]. The oxidation of adatoms in PPs was suggested experimentally by observing Si2p and O1s photoemission spectra with synchrotron radiation in conjunction with STM observation [17]. The variation of oxygen adsorption structures by thermal annealing from a room temperature was observed by SR-XPS and STM.…”
Section: Stable Structure Of Three O Atomsmentioning
confidence: 92%