XPS and SIMS analysis of gold silicide grown on a bromine passivated Si(111) substrate

Sundaravel, B.; Sekar, K.; Kuri, G.; Satyam, P.V.; Dev, B. N.; Bera, Santanu; Narasimhan, S.V.; Chakraborty, Purushottam; Caccavale, F.

doi:10.1016/s0169-4332(98)00378-x

Cited by 35 publications

(31 citation statements)

References 44 publications

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“…The shoulder of the Au 4f doublet does not shift as a function of sputtering time, placed at 1.1 eV towards higher BE and the spin orbit splitting of 3.7 eV. The binding energy shift is consistent with previous reports on the Au/Si interface, in which it ranges from 0.6 to 1.2 eV[26][27][28]51 .…”

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confidence: 90%

Nanoscale-Induced Formation of Silicide around Gold Nanoparticles Encapsulated in a-Si

et al. 2020

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Decorating thin film solar cells with plasmonic nanoparticles is being pursued, in order to improve device efficiency through increased scattering and local field enhancement. Gold nanoparticles are in particular interesting, due to their chemical inertness and plasmon resonance in the visible range of the spectrum.In this work, gold nanoparticles fabricated by a gas aggregation nanoparticle source and embedded in a-Si (a commercial solar cell material) are studied using x-ray photo-electron spectroscopy, transmission electron microscopy, electron energy-loss spectroscopy and energy dispersive X-ray spectroscopy. The formation of gold silicide around the nanoparticles is investigated, as it has important consequences for the optical and electronic properties of the structures. Differently from previous studies, in which the silicide formation is observed for gold nanoparticles and thin films grown on top of crystalline silicon or silica, it is found that silicide formation is largely enhanced around the nanoparticles, owing to their increased surface/volume ratio. A detailed gold silicide formation mechanism is presented based on the results, and strategies for optimizing the design of plasmonically enhanced solar cells with gold nanoparticles encapsulated in a-Si are discussed.

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Nanoscale-Induced Formation of Silicide around Gold Nanoparticles Encapsulated in a-Si

et al. 2020

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“…Deconvolution of these lines showed the presence of two peaks in each line. For instance, the peaks of Au 4 f 7/2 line appear at 85.33 eV, which is a characteristic of metallic gold, and at 83.9 eV, 1.43 eV higher in BE can be ascribed to silicide [ 21 - 23 ]. Moreover, the 83.9 eV peak is due to the interaction of gold with silicon at the interface [ 24 ] by laser irradiation, resulting the formation of gold silicide in the nanoparticles aggregate.…”

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confidence: 99%

Characterization of MHz pulse repetition rate femtosecond laser-irradiated gold-coated silicon surfaces

2011

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In this study, MHz pulse repetition rate femtosecond laser-irradiated gold-coated silicon surfaces under ambient condition were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction analysis (XRD), and X-ray photoelectron spectroscopy (XPS). The radiation fluence used was 0.5 J/cm2 at a pulse repetition rate of 25 MHz with 1 ms interaction time. SEM analysis of the irradiated surfaces showed self-assembled intermingled weblike nanofibrous structure in and around the laser-irradiated spots. Further TEM investigation on this nanostructure revealed that the nanofibrous structure is formed due to aggregation of Au-Si/Si nanoparticles. The XRD peaks at 32.2°, 39.7°, and 62.5° were identified as (200), (211), and (321) reflections, respectively, corresponding to gold silicide. In addition, the observed chemical shift of Au 4f and Si 2p lines in XPS spectrum of the irradiated surface illustrated the presence of gold silicide at the irradiated surface. The generation of Si/Au-Si alloy fibrous nanoparticles aggregate is explained by the nucleation and subsequent condensation of vapor in the plasma plume during irradiation and expulsion of molten material due to high plasma pressure.

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“…This has for example motivated the great number of investigations of metal/Si interfaces reported during the last two decades [1]. When for example a few monolayers of gold are deposited on silicon substrates formation of crystalline Au-silicides at the Au/Si interface has been reported [1][2][3][4]. Several stable surface reconstructions have been observed to form depending on the amount of Au deposited and the annealing temperature applied.…”

Section: Introductionmentioning

confidence: 99%

Electronic structure study of reconstructed Au–SiC(0001) surfaces

Virojanadara

Johansson

2006

Surface Science

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XPS and SIMS analysis of gold silicide grown on a bromine passivated Si(111) substrate

Cited by 35 publications

References 44 publications

Nanoscale-Induced Formation of Silicide around Gold Nanoparticles Encapsulated in a-Si

Nanoscale-Induced Formation of Silicide around Gold Nanoparticles Encapsulated in a-Si

Characterization of MHz pulse repetition rate femtosecond laser-irradiated gold-coated silicon surfaces

Electronic structure study of reconstructed Au–SiC(0001) surfaces

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