Xenon bubbles formed by ion implantation in zirconium alloy films

Cummings, R.; Blackmur, Matthew S.; Grunwald, Mateusz; Minty, Andrew; Styman, Paul; MacLaren, Ian

doi:10.1016/j.jnucmat.2021.153497

Cited by 2 publications

(2 citation statements)

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“…He has been particularly investigated due to its technological interest in studying damage in nuclear reactor materials [ 7 , 8 ]. The implantation of other noble gases such as Ne, Ar and Xe has also been investigated [ 9 , 10 , 11 ], showing the accumulation of gas trapped in bubbles. Implantation studies refer to a “top-down” methodology with interest in studying materials’ degradation in nuclear reactors [ 7 , 8 ] and defect engineering in electronic device development [ 12 , 13 ].…”

Section: Introductionmentioning

confidence: 99%

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Fernández,

Godinho,

Ávila

et al. 2024

Nanomaterials

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Sputtering of silicon in a He magnetron discharge (MS) has been reported as a bottom-up procedure to obtain He-charged silicon films (i.e., He nanobubbles encapsulated in a silicon matrix). The incorporation of heavier noble gases is demonstrated in this work with a synergistic effect, producing increased Ne and Ar incorporations when using He–Ne and He–Ar gas mixtures in the MS process. Microstructural and chemical characterizations are reported using ion beam analysis (IBA) and scanning and transmission electron microscopies (SEM and TEM). In addition to gas incorporation, He promotes the formation of larger nanobubbles. In the case of Ne, high-resolution X-ray photoelectron and absorption spectroscopies (XPS and XAS) are reported, with remarkable dependence of the Ne 1s photoemission and the Ne K-edge absorption on the nanobubble’s size and composition. The gas (He, Ne and Ar)-charged thin films are proposed as “solid” targets for the characterization of spectroscopic properties of noble gases in a confined state without the need for cryogenics or high-pressure anvils devices. Also, their use as targets for nuclear reaction studies is foreseen.

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Section: Introductionmentioning

confidence: 99%

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Fernández,

Godinho,

Ávila

et al. 2024

Nanomaterials

View full text Add to dashboard Cite

show abstract

“…Helium has been particularly investigated due to its technological interest to study damage in nuclear reactor materials [7,8]. The implantation of other noble gases such as Ne, Ar and Xe has been also investigated [9][10][11] showing accumulation of gas trapped in bubbles. Implantation studies refer to a "top-down" methodology with interest to study materials' degradation in nuclear reactors [7,8] and defect engineering in electronic devices development [12,13].…”

Section: Introductionmentioning

confidence: 99%

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Fernández,

Godinho,

Avila

et al. 2024

Preprint

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: Sputtering of silicon in a Helium magnetron discharge (MS) has been reported as a bottom-up procedure to obtain He-charged silicon films (i.e. He nanobubbles encapsulated in a silicon matrix). The incorporation of heavier noble gases is demonstrated in this work with a synergistic effect producing increased Ne and Ar incorporations when using He-Ne and He-Ar gas mixtures in the MS process. Microstructural and chemical characterizations are reported by ion beam analysis (IBA) and scanning and transmission electron microscopies (SEM and TEM). In addition to gas incorporation, helium promotes the formation of larger nanobubbles. For the case of Ne high resolution X-ray photoelectron and absorption spectroscopies (XPS and XAS) are reported with remarkable dependence of the Ne 1s photoemission and the Ne K-edge absorption on the nanobubbles size and composition. The gas (He, Ne, Ar) charged thin films are proposed as “solid” targets for the characterization of spectroscopic properties of noble gases in a confined state without the need for cryogenics or high-pressure anvils devices. Also their use as targets for nuclear reaction studies is foreseen.

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Xenon bubbles formed by ion implantation in zirconium alloy films

Cited by 2 publications

References 50 publications

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

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