X-Ray Microscopy of Biological Objects with Carbon K _α and with Synchrotron Radiation

Abstract

X-ray micrographs of biological objects have been obtained with a resolution better than 1000 angstroms by using poly(methyl methacrylate) x-ray resist and carbon Kalpha or synchrotron radiation. Synchrotron radiation allows short exposure times; storage rings especially designed as radiation sources and improved x-ray resists would make exposure times under 1 second possible.

Fabrication of 200 nm period centimeter area hard x-ray absorption gratings by multilayer deposition

“…The contact radiography was based on the method developed by Spiller and co-authors for x-ray microscopy[26, 36] with one modification. We coated <100> silicon wafers with the electron beam resist ZEP520A (Zeon Corporation) to be used as x-ray film plates.…”

Photoelectron microscope for x-ray microscopy and microanalysis

“…Assume a homogeneous absorption for all types of electrons. An incident x-ray photon will induce the emission of a bunch of secondaries with a probability: (1) where r.r' I' p, rs are, respectively, the penetration range for x rays, primary, and secondary photoelectrons, and t is the thickness of the photoemissive layer. Often, one can assume:…”

Orientation of Crystalline Overlayers on Amorphous Substrates by Artificially Produced Surface Relief Structures

“…The procedure used for fabricating square-wave surface 176 relief structures is illustrated. [5][6][7][8][9][10][11][12][13][14][15][16][17][18][19]. A transmission-electron-micrograph is shown of gold islands 178 on an amorphous Si0 2 surface with a 1.5-nm-deep 320-nm-period squarewave surface-relief grating fabricated using ion-beam-etching.…”

“…A transmission-electron-micrograph is shown of gold islands 178 on an amorphous Si0 2 surface with a 1.5-nm-deep 320-nm-period squarewave surface-relief grating fabricated using ion-beam-etching. [5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20]. A transmission-electron-micrograph is shown of a gold deposit of 179 1.5 nm average thickness on a square-wave-grating surface-relief structure in SiO x fabricated by liftoff of evaporated Si02.…”