X-ray diffraction by phase diffraction gratings

Abstract

The diffraction properties of phase gratings with the period D = 1.6, 1.0 and 0.5 mm fabricated on an Si(111) crystal by e-beam lithography were studied by triple-axis X-ray diffraction. A 100 nm-thick tungsten layer was used as a phaseshift layer. It is shown that the presence of a grating as a phase-shift W layer on the surface of the Si(111) crystal causes the formation of a complicated twodimensional diffraction pattern related to the diffraction of X-rays on the phase grating at the X-ray entrance and exit from the crystal. A model of X-ray diffraction on the W phase diffraction grating is proposed.

Applications of dynamical theory of X-ray diffraction by perfect crystals to reciprocal space mapping

“…Recently, triple-crystal X-ray diffraction (Iida & Kohra, 1979;Zaumseil & Winter, 1982) has been successfully applied to investigate a variety of crystalline structures (Bhagavannarayana & Zaumseil, 1997;Kazimirov et al, 1990;Faleev et al, 2013;Lomov et al, 2014;Punegov, 2015) and X-ray optical elements (Jergel et al, 1999;Irzhak et al, 2015). Despite the fact that diffracted waves contain both coherent and diffuse scattered components, typically only the latter, caused by scattering on defects, is analysed, often only qualitatively.…”