WITHDRAWN: Diagnostics of Plasmas for Materials Processing

Manos, D. M.; Dylla, H. F.

doi:10.1016/b978-0-08-092446-5.50009-3

Cited by 31 publications

(41 citation statements)

References 128 publications

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“…The sintered colloidal crystals were then exposed to HNB of oxygen gas for the partial etching of PS microspheres. In doing this, the energetic neutral oxygen gas collides with PS microspheres and reacts with the hydrophobic surfaces to generate gaseous H 2 O, CO, or CO 2 leaving behind the partially etched particles, each connected with twelve nearest neighbors through very thin cylinders . The etching chamber was operated at 80 mTorr of oxygen pressure for given etching time intervals.…”

Section: Resultsmentioning

confidence: 99%

Connected Open Structures from Close-Packed Colloidal Crystals by Hyperthermal Neutral Beam Etching

Cho

Moon

et al. 2005

Langmuir

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We report the fabrication of connected open structures from close-packed colloidal crystals by hyperthermal neutral beam etching. Colloidal crystal films of polystyrene microspheres were prepared by a vertical deposition method. Exposure of the colloidal crystal films to hyperthermal neutral beam made isolated microspheres in the face-centered cubic lattice, each of which was connected with its twelve nearest neighbors through very thin cylinders. Due to the charge neutrality of impinging gas molecules of the hyperthermal neutral beam, the spherical shape of polymer microspheres was almost maintained during the etching process. The Bragg reflection peaks were modulated by the etched volume of colloidal crystals. Finally, the inverse structures of such open structures were replicated by a simple room-temperature chemical vapor deposition and subsequently burning out polymer template spheres.

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Section: Resultsmentioning

confidence: 99%

Connected Open Structures from Close-Packed Colloidal Crystals by Hyperthermal Neutral Beam Etching

Cho

Moon

et al. 2005

Langmuir

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“…[1][2][3] They are used to protect the ceramic parts inside etchers or chemical vapor deposition reactor chambers from corrosion caused by fluorocarbon corrosive gases such as CF 4 , C 2 F 6 , and Cl 2 . [4][5][6][7] These oxide ceramic coating materials easily interact with plasma and erode, resulting in particles that may contaminate the wafer and further affect the etching product. 8) To overcome this problem, yttrium-based ceramic materials are currently produced using atmospheric plasma spraying (APS) coatings as plasma-facing wall materials owing to their high thermal shock resistance and low etch rates, thus significantly increasing the lifetime of the ceramic parts.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of yttrium fluoride and yttrium oxide coatings for plasma process equipment prepared by atmospheric plasma spraying

Lin¹,

Wuu²,

Huang³

et al. 2016

Jpn. J. Appl. Phys.

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In this study, yttrium fluoride (YF3) and yttrium oxide (Y2O3) coatings were prepared by an atmospheric plasma spraying technique and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). YF3 powders were sprayed at various plasma spraying powers of 9, 15, and 21 kW. The XRD result indicates that the YF3 coating shows preferred orientations and was well crystallized. The XPS results revealed a strong Y–F bond on the YF3 coating surface. A porosity value analysis showed that the porosity of the YF3 coating was lower than that of the Y2O3 coating. Moreover, the dielectric strength of the YF3 coating (22.65 kV/mm) was higher than that of the Y2O3 coating (14.42 kV/mm). This confirms that the YF3 coating exhibits a breakdown voltage of 4.97 kV, which is more than 1.5 times higher than that observed for the Y2O3 coating (3.29 kV). These results indicate that the YF3 coating has better mechanical and dielectric properties than the Y2O3 coating, indicating that the YF3 coating is a very attractive novel antiplasma and corrosion-resistant material.

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“…The purpose of this article is to review the microwave interferometry data obtained from the GEC reactor to date [ 4 – 6 ], including a description of the measurement methods and equipment. The latter will be briefly presented in the next section on the basic equations and equipment for the sake of completeness; but, several excellent chapters [ 3 , 7 – 10 ] and texts [ 11 , 12 ] on microwave diagnostic techniques convey both more general and in depth information which is not presented here. In the final section, representative data from plasmas through argon, helium, nitrogen and carbon tetrafluoride in the GEC reactor are given as a function of the rf current and time.…”

Section: Introductionmentioning

confidence: 99%

Microwave Diagnostic Results From the Gaseous Electronics Conference Rf Reference Cell

Overzet¹

1995

J. Res. Natl. Inst. Stand. Technol.

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Electron density measurements with even the simplest microwave interferometry techniques can range over three to four orders of magnitude, can be responsive on time scales as fast as 50 ns, and are simple to obtain and interpret. Three groups have published electron density data taken in the Gaseous Electronics Conference (GEC) reference reactor using microwave interferometry. The agreement in the data from these groups at higher pressures is excellent especially when one considers that the GEC reactors involved have some key differences. These may have been the cause of some differences between the results obtained at low pressures, although, the manner in which the measurements were interpreted may also have contributed. The electron densities compare favorably in argon, helium, and nitrogen above 33.3 Pa (250 mTorr); but, the measurements tend to diverge some at 13.3 Pa (100 mTorr) and in 133 Pa helium above approximately 200 mA. It is speculated that the latter difference occurs as the discharges change from a bulk ionization or α-mode to a secondary electron emission or γ-mode, and that this transition occurs at lower voltages and currents for reactors with aluminum electrodes than it does for those with stainless steel electrodes. In addition, time resolved electron densities are presented. There is agreement between time resolved measurements in the two reactors, in particular, the electron density in helium discharges is found to rise dramatically after the rf excitation is turned off while the electron densities in argon and nitrogen glows exhibit only slight increases.

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WITHDRAWN: Diagnostics of Plasmas for Materials Processing

Cited by 31 publications

References 128 publications

Connected Open Structures from Close-Packed Colloidal Crystals by Hyperthermal Neutral Beam Etching

Connected Open Structures from Close-Packed Colloidal Crystals by Hyperthermal Neutral Beam Etching

Characteristics of yttrium fluoride and yttrium oxide coatings for plasma process equipment prepared by atmospheric plasma spraying

Microwave Diagnostic Results From the Gaseous Electronics Conference Rf Reference Cell

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