2011
DOI: 10.1016/j.jcrysgro.2010.11.091
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Wide-range temperature dependence of epitaxial graphene growth on 4H-SiC (000−1): A study of ridge structures formation dynamics associated with temperature

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Cited by 9 publications
(8 citation statements)
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“…In order to exfoliate a single sheet, van der Waals attraction between exactly the first and second layers must be overcome without disturbing any subsequent sheets (Allen, Tung et al 2010). Many studies emerged over the last years with alternatives to mechanical exfoliation including chemical vapour deposition (Zhao, Rim et al 2011), epitaxial growth (Ushio S, Arata Yoshii et al 2011), carbon nanotube cutting (Janowska, Ersen et al 2009), chemical exfoliation (Wang, Robinson et al 2009) and direct sonication (Lotya, Hernandez et al 2009). Each of these methods presents both advantages and disadvantages, dealing with cost and scalability.…”
Section: Introductionmentioning
confidence: 99%
“…In order to exfoliate a single sheet, van der Waals attraction between exactly the first and second layers must be overcome without disturbing any subsequent sheets (Allen, Tung et al 2010). Many studies emerged over the last years with alternatives to mechanical exfoliation including chemical vapour deposition (Zhao, Rim et al 2011), epitaxial growth (Ushio S, Arata Yoshii et al 2011), carbon nanotube cutting (Janowska, Ersen et al 2009), chemical exfoliation (Wang, Robinson et al 2009) and direct sonication (Lotya, Hernandez et al 2009). Each of these methods presents both advantages and disadvantages, dealing with cost and scalability.…”
Section: Introductionmentioning
confidence: 99%
“…We used 4 • off-axis 4H-SiC wafers as a substrate, and we grew ordered and homogeneous graphene ribbons across the whole surface of the wafer, with a width up to 40 µm and a length up to 1000 µm. It is worth noting that the ordered ribbons grown along the templates did not have any micro defects such as grain boundaries, ridges, or mono-and few-layer graphene mixtures, compared to graphene grown on on-axis 4H-SiC wafer whose surface is nearly step-free [45,46]. Our results shed light on the growth of high-quality graphene film on silicon carbide crystal.…”
Section: Introductionmentioning
confidence: 65%
“…The main preparation methods for high-quality graphene are the micro-mechanical stripping method [4], the epitaxial growth method [5], the graphite oxide reduction method [6], and the chemical vapor deposition method [7]. The graphene prepared using the micromechanical exfoliation and epitaxial growth method presents as single-layer graphene with high purity [8]. However, the graphene prepared with such technology is only used at the laboratory level due to its extremely low output and high requirements for hardware facilities, which greatly affects the commercialization process of graphene.…”
Section: Introductionmentioning
confidence: 99%