Weakly guiding approximation of a three-dimensional waveguide model for extreme ultraviolet lithography simulation
Hiroyoshi Tanabe,
Akira Jinguji,
Atsushi Takahashi
Abstract:A three-dimensional (3D) waveguide model is applied in extreme ultraviolet (EUV) lithography simulations. The 3D waveguide model is equivalent to rigorous coupled-wave analysis, but fewer field components are used to solve Maxwell’s equations. The 3D waveguide model uses two components of vector potential, A
x
and A
y
, corresponding to the two polarizations. The electric field of the A
x
polarization is approximately parallel to the x axis, and the electric field of the A
… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.