The cationic photopolymerization of epoxy polysilsesquioxane resins synthesized through a acid‐catalyzed sol/gel process is studied. To elucidate the effect of the organic substituent on sol/gel reaction kinetics, two organotrimethoxysilanes with different organic groups were employed. Effects of UV irradiation on the microstructure of the epoxy‐functional polysilsesquioxanes were also studied. 29Si solid‐state MAS NMR proved that UV‐generated Brönsted acids favored a work‐up of the silicate network by promoting new sol/gel condensation reactions. There was a significant slowdown of epoxy conversion rates with increasing sol aging, which may be due to a competition between an active chain end and an activated monomer mechanism for the epoxy cationic polymerization.magnified image