Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces
Jeetendra Gour,
Sebastian Beer,
Pallabi Paul
et al.
Abstract:In the rapidly evolving field of plasmonic metasurfaces, achieving homogeneous, reliable, and reproducible fabrication of sub-5 nm dielectric nanogaps is a significant challenge. This article presents an advanced fabrication technology that addresses this issue, capable of realizing uniform and reliable vertical nanogap metasurfaces on a whole wafer of 100 mm diameter. By leveraging fast patterning techniques, such as variable-shaped and character projection electron beam lithography (EBL), along with atomic l… Show more
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