VUV/UV/Chlorine as an Enhanced Advanced Oxidation Process for Organic Pollutant Removal from Water: Assessment with a Novel Mini-Fluidic VUV/UV Photoreaction System (MVPS)

Li, Mengkai; Qiang, Zhimin; Hou, Pin; Bolton, James R.; Qu, Jiuhui; Li, Peng; Wang, Chen

doi:10.1021/acs.est.6b00133

Cited by 86 publications

(54 citation statements)

References 33 publications

(58 reference statements)

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“…We reported that the amount of ammonia produced increases upon VUV/UV light irradiation. 5 H 2 O is dissociated by VUV radiation, as shown in the reaction below:

true normalH_{2} normalO \to normalH + OH

…”

Section: Resultsmentioning

confidence: 99%

Contribution of Discharge Excited Atomic N, N₂*, and N₂⁺to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

et al. 2019

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Electric‐discharge nitrogen comprises three main types of excited nitrogen species‐atomic nitrogen (Natom), excited nitrogen molecules (N2*), and nitrogen ions (N2+) – which have different lifetimes and reactivities. In particular, the interfacial reaction locus between the discharged nitrogen and the water phase produces nitrogen compounds such as ammonia and nitrate ions (denoted as N‐compounds generically); this is referred to as the plasma/liquid interfacial (P/L) reaction. The Natom amount was analyzed quantitatively to clarify the contribution of Natom to the P/L reaction. We focused on the quantitative relationship between Natom and the produced N‐compounds, and found that both N2* and N2+, which are active species other than Natom, contributed to P/L reaction. The production of N‐compounds from N2* and N2+ was enhanced upon UV irradiation of the water phase, but the production of N‐compounds from Natom did not increase by UV irradiation. These results revealed that the P/L reactions starting from Natom and those starting from N2* and N2+ follow different mechanisms.

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“…We reported that the amount of ammonia produced increases upon VUV/UV light irradiation. 5 H 2 O is dissociated by VUV radiation, as shown in the reaction below:

true normalH_{2} normalO \to normalH + OH

…”

Section: Resultsmentioning

confidence: 99%

Contribution of Discharge Excited Atomic N, N₂*, and N₂⁺to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

et al. 2019

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“…Where q can be converted to photon fluence rate ( E o,p ) by a conversion coefficient and is used here for simplicity;

ϕ

is the apparent quantum yield for H 2 O 2 production, and V is the reaction volume (50 mL).…”

Section: Resultsmentioning

confidence: 99%

A Green Method to Determine VUV (185 nm) Fluence Rate Based on Hydrogen Peroxide Production in Aqueous Solution

Yang

et al. 2018

Photochem & Photobiology

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A mini-fluidic vacuum ultraviolet/ultraviolet (VUV/UV) photoreaction system (MVPS) was developed in our previous study. Based on the MVPS, a green method to determine VUV fluence rate has been developed using the production rate of H O when water is exposed to 185 nm VUV. The H O production followed pseudo-zero-order reaction kinetics well over the first 10 min of VUV/UV exposure. This new method was well calibrated with a standard cis-cyclooctene cis-trans photoisomerization actinometer as recommended by the International Union of Pure and Applied Chemistry. The apparent quantum yield for H O production by 185 nm VUV irradiation of water was determined to be 0.024 ± 0.002. As the solution pH increased from 5.0 to 8.0, the H O production rate decreased from 0.83 to 0.40 μm min . Dissolved oxygen had a negligible influence on the H O production. This study proposes a novel VUV fluence rate determination method with advantages of nontoxicity, low detection limits, low costs and convenience, and it can be used as a good alternative to traditional actinometers.

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“…Low-pressure (LP) mercury lamps are a highly efficient UV light source for water treatment, with a photon-energy efficiency of approximately 36% [12]. By using J o u r n a l P r e -p r o o f synthetic silica in the production of the lamp tube, LP mercury lamps can deliver two major resonance lines at 185 and 254 nm (i.e., vacuum-UV (VUV)/UV irradiation), and the manufacturing and operating costs of VUV/UV LP mercury lamps are close to those of a conventional LP mercury lamp [13]. VUV (185 nm) readily photolyzes H2O into HO • by homolysis and ionization (Eqs.…”

Section: Introductionmentioning

confidence: 99%

Methylene blue degradation by the VUV/UV/persulfate process: Effect of pH on the roles of photolysis and oxidation

Wen

et al. 2020

Journal of Hazardous Materials

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Graphical Abstract Highlights  VUV/UV/persulfate (VUV/UV/PS) process obviously enhanced methylene blue degradation. VUV UV HO • other SO 4 •-J o u r n a l P r e -p r o o f  Degradation and mineralization of methylene blue exhibited different trends with pH. HO • and SO4 •were proved to be the principal reactive oxygen species. The application potential of VUV/UV/PS process was demonstrated in real waters. Solution pH notably affected photon absorption distributions and reaction mechanism. AbstractThis study investigated methylene blue (MB) degradation by the vacuumultraviolet/ultraviolet/persulfate (VUV/UV/PS) process using a mini-fluidic VUV/UV photoreaction system. Results show that MB degradation by the VUV/UV/PS process was significantly higher than that of the conventional UV/PS process, as the VUV photolysis of H2O and PS generated more reactive oxygen species (ROSs). HO • and SO4 •-, identified as the main ROSs, were mostly consumed by dissolved organic carbon and Clin real waters, respectively. Additionally, the impacts of solution pH and the concentrations of PS, humic acid, and inorganic ions (HCO3 -, Cl -, NO3 -, SO4 2-, Fe(II), and Fe(III)) were systematically evaluated. The solution pH significantly affected the photon absorption distributions, as well as the contributions of photolysis and oxidation to MB degradation, resulting in different variations in the degradation rate constant and total organic carbon removal ratio with increasing solution pH. At all tested pH levels (3.0-11.0), particularly under acidic conditions, HO • and SO4 •were two predominant contributors to MB degradation, while VUV and UV photolysis contributed more when the solution pH increased. This study provides a highly efficient process for organic J o u r n a l P r e -p r o o f pollutant removal, which could be applied in water treatment. S O 2 SO ( 1.4) hv        (1) Low-pressure (LP) mercury lamps are a highly efficient UV light source for water treatment, with a photon-energy efficiency of approximately 36% [12]. By using J o u r n a l P r e -p r o o f

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VUV/UV/Chlorine as an Enhanced Advanced Oxidation Process for Organic Pollutant Removal from Water: Assessment with a Novel Mini-Fluidic VUV/UV Photoreaction System (MVPS)

Cited by 86 publications

References 33 publications

Contribution of Discharge Excited Atomic N, N₂*, and N₂⁺to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

Contribution of Discharge Excited Atomic N, N₂*, and N₂⁺to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

A Green Method to Determine VUV (185 nm) Fluence Rate Based on Hydrogen Peroxide Production in Aqueous Solution

Methylene blue degradation by the VUV/UV/persulfate process: Effect of pH on the roles of photolysis and oxidation

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VUV/UV/Chlorine as an Enhanced Advanced Oxidation Process for Organic Pollutant Removal from Water: Assessment with a Novel Mini-Fluidic VUV/UV Photoreaction System (MVPS)

Cited by 86 publications

References 33 publications

Contribution of Discharge Excited Atomic N, N2*, and N2+to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

Contribution of Discharge Excited Atomic N, N2*, and N2+to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

A Green Method to Determine VUV (185 nm) Fluence Rate Based on Hydrogen Peroxide Production in Aqueous Solution

Methylene blue degradation by the VUV/UV/persulfate process: Effect of pH on the roles of photolysis and oxidation

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Contribution of Discharge Excited Atomic N, N₂*, and N₂⁺to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

Contribution of Discharge Excited Atomic N, N₂*, and N₂⁺to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis