VUV lasing in diffuse discharges formed by runaway electrons

Abstract

The parameters of stimulated emission in diffuse discharges formed in a sharply inhomogeneous electric field by runaway electrons in mixtures of rare gases with the addition of H2 and F2 at pressures up to 10 atm are studied. Efficient VUV lasing was obtained at wavelengths from 148 to 193 nm on the transitions of H2, F2 and exciplex ArF* molecules. It was shown that the addition of He buffer gas increases the pulse duration, while Ne addition improves the output energy of the VUV laser on the H2 Lyman band. A laser pulse duration over 10 ns and an output of 0.12 mJ were obtained. The diffuse discharge in mixtures of He with F2 was found to form as a result of successive ionization waves. It was shown that the laser pulse at 157 nm has three peaks, which correspond to the maxima of the diffuse discharge current. Therewith, the first or second peak of the laser radiation has the maximum intensity, depending on the amplitude of the conduction current in the primary ionization wave. A maximal F2* laser electrical efficiency of η 0 = 0.18% and an output of Q 157 = 3.8 mJ were obtained in a He–F2 gas mixture at pressure of 10 atm, which exceeds the efficiency of lasers of this type pumped by transverse volume discharges with UV preionization. Long-pulse operation of the ArF* laser was achieved in a He–Ne–Ar–F2 gas mixture. Lasing at 193 nm continued during two periods of the diffuse discharge current. The total duration of the laser pulse was as long as 40 ns, and the radiation energy at 193 nm was as high as 2 mJ from an active volume of 20 cm3.