2008
DOI: 10.2172/942062
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Volumetric plasma source development and characterization.

Abstract: The development of plasma sources with densities and temperatures in the 10 15 -10 17 cm -3 and 1-10eV ranges which are slowly varying over several hundreds of nanoseconds within several cubic centimeter volumes is of interest for applications such as intense electron beam focusing as part of the x-ray radiography program. In particular, theoretical work [1,2] suggests that replacing neutral gas in electron beam focusing cells with highly conductive, pre-ionized plasma increases the time-averaged e-beam intens… Show more

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