2018 IEEE 68th Electronic Components and Technology Conference (ECTC) 2018
DOI: 10.1109/ectc.2018.00225
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Void-Free Copper Pillar Hybrid Wafer Bonding Using a BCB Based Polymer Adhesive and Chemical Mechanical Polishing

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Cited by 8 publications
(4 citation statements)
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“…Therefore, to obtain a high‐quality Cu/polymer interface, the following multiple processing steps are required: 1) polymer's CMP covered on Cu, 2) aggressive CMP to lower the height of Cu, and 3) fine CMP to secure the roughness of Cu. [ 32 ]…”
Section: Challenges Of Cu/polymer Hybrid Bondingmentioning
confidence: 99%
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“…Therefore, to obtain a high‐quality Cu/polymer interface, the following multiple processing steps are required: 1) polymer's CMP covered on Cu, 2) aggressive CMP to lower the height of Cu, and 3) fine CMP to secure the roughness of Cu. [ 32 ]…”
Section: Challenges Of Cu/polymer Hybrid Bondingmentioning
confidence: 99%
“…Fully cured polymer hybrid bonding is being actively studied through Benzocyclobutene (BCB), Polyimide (PI), SU-8, and Cyclic-olefin polymers (COP), as summarized in Table 1. [32][33][34][35][36][37][38] These materials have high heat resistance; so, they can be applied even at high bonding temperatures. In addition, they have little flowability and excellent physical properties; so, they can withstand processes such as CMP.…”
Section: Process Of Cu/polymer Hybrid Bondingmentioning
confidence: 99%
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“…The (111)-oriented nt-Cu was fabricated by electroplating. This research can provide helpful information to improve the current Cu/dielectric hybrid bonding technology using the high-CTE dielectrics, such as polyimide (PI) [ 35 ], polybenzoxazole (PBO) [ 36 ], benzocyclobutene (BCB) [ 37 ], and epoxy thermosets [ 38 ].…”
Section: Introductionmentioning
confidence: 99%