2016
DOI: 10.1016/j.solmat.2016.06.039
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Void formation in screen-printed local aluminum contacts modeled by surface energy minimization

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Cited by 19 publications
(8 citation statements)
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“…The relatively deeper local Al‐BSF of the PERC+ is dependent on the narrower contact width and lower peak firing temperature as shown in Figure S2 (Supporting Information), which leads to higher silicon concentrations in the Al finger and a reduced number of voids, and lowers the local Al‐BSF recombination current density J 0,BSF from 500 to 350 fA/cm 2. To determine J 0,BSF as extracted by the quasi‐steady‐state photoconductance decay method, we use a different fraction of the local BSF area method . The SE improves the η of the PERC and PERC+ solar cells up to 21.6% and 21.7%, and the V OC to 672 and 679 mV, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…The relatively deeper local Al‐BSF of the PERC+ is dependent on the narrower contact width and lower peak firing temperature as shown in Figure S2 (Supporting Information), which leads to higher silicon concentrations in the Al finger and a reduced number of voids, and lowers the local Al‐BSF recombination current density J 0,BSF from 500 to 350 fA/cm 2. To determine J 0,BSF as extracted by the quasi‐steady‐state photoconductance decay method, we use a different fraction of the local BSF area method . The SE improves the η of the PERC and PERC+ solar cells up to 21.6% and 21.7%, and the V OC to 672 and 679 mV, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…Further analysis reveals that voids in particular occur for Al contacts where the Al-Si eutectic extends more than 20 µm deep into the Si wafer. 23) To explain this finding, we proposed an analytical model that calculates the surface energies of the liquid Al-Si melt, the Si wafer surface and the screen-printed Al particle surface. 23) According to this model, voids form for deep contacts since then during furnace firing a sufficient amount of Al-Si melt is available in order to wet the large surface area of Al particles rather than the small Si wafer surface area.…”
Section: Industrial Perc+ Solar Cellsmentioning
confidence: 99%
“…SEMDCI has now been used widely to characterize industrial Si wafers with p‐type (boron) diffused emitters [ 18–22 ] and aluminum localized back surface contacts (LBSF). [ 23–33 ] However, reports of SEMDCI imaging of phosphorus emitters are less common, including homogeneous diffused emitters, [ 34–36 ] and localized selective emitters. [ 20,37 ] A more recent PV application of SEMDCI imaging has been characterizing nanotextured BSi.…”
Section: Introductionmentioning
confidence: 99%
“…SEMDCI has now been used widely to characterize industrial Si wafers with p-type (boron) diffused emitters [18][19][20][21][22] and aluminum localized back surface contacts (LBSF). [23][24][25][26][27][28][29][30][31][32][33] However, reports of SEMDCI Phosphorous dopant diffusion profiles feature in many silicon semiconductor devices, including the vast majority of silicon solar cells. Accurate spatially resolved dopant profiling is crucial for understanding the performance of these diffused regions, however, it is very challenging to obtain such profiles in non-planar samples.…”
mentioning
confidence: 99%