VO₂ Thin Film as a Temperature Activated Electromagnetic Shield

Structural and electrical properties of high-performance vanadium dioxide thin layers obtained by reactive magnetron sputtering

“…As often reviewed in the literature, the macroscopic electrical and optical performances of VO2 thin films are highly affected by their structural, chemical, and morphological characteristics, which are highly dependent on the experimental parameters of the deposition process [22]. It is also observed that the electrical resistivity ratio can be as high as 10 3 and even 10 5 in some instances, although 5 orders of magnitude in a VO2 electrical transition is rarely reported [23,24]. The methods employed for obtaining high-quality thin VO2 films include pulsed laser deposition [25], magnetron sputtering [26], or e-beam evaporation [27,28], as well as chemical methods such as sol-gel deposition [29,30].…”