VLSI Photonics: How Can We Approach Using Micro/Nano-Materials?

Abstract

This paper presents our recent results on the materials science and engineering research that we are pursuing for what we call very large scale integrated (VLSI) micro=nano-photonic circuit applications and optical printed circuit board (O-PCB) applications. It discusses on the design and fabrication of optical waveguides and photonic devices to be part of the micro=nano-photonic integration for VLSI photonic integrated circuits of generic and application-specific nature. The optical circuits consist of 2-dimensional planar arrays of micro=nano-optical wires, circuits and devices to perform various functions. The integrated optical circuits are primarily made of polymer and silicon materials. We present the use of organic-inorganic hybrid materials for micro-scale optical waveguide fabrication and discuss various attempts to vary the optical properties such as refractive indices, transmission windows, losses, birefringence, dispersion, nonlinearity, thermal=mechanical stability, and related issues. These waveguides and devices are considered particularly useful for O-PCB fabrication. We then present the use of silicon as a basic material for VLSI photonic devices. We discuss their properties and advantages for nanoscale functional waveguides and devices for VLSI photonics. We will look into the use of silicon materials as the basis for the building blocks of VLSI photonics. We will finally discuss the issues regarding how these building blocks can be put together for integration for O-PCB and VLSI photonic chips.