Positive-working photoresists based on poly(p-hydroxystyrene) (PHS), 2,2-bis[4-(2-(vinyloxy)ethoxy)phenyl] propane (BPA-DEVE) has been investigated on their sensitivities to 488-nm argon ion laser using binary acid generated system. 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-tnazine (TAZ114), diphenyliodonium p-toluenesulfonate (DITS) and diphenyliodonium trifluoromethanesulfonate (DITFMS) were used as photoacid generator. Acridine orange, rose bengal, thioxanten-9-one and 3,3'-carbonylbis(7,7'-diethylaminocoumarin) (KCD) were used as sensitizing dye. In these photopolymers, the polymer containing of TAZ 114 and acridine orange exhibits the highest sensitivity to 488-nm light at 147.5 mJ1cm2.