2011
DOI: 10.3390/coatings1020117
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Very Low Pressure Plasma Spray—A Review of an Emerging Technology in the Thermal Spray Community

Abstract: Abstract:A fundamentally new family of thermal spray processes has emerged. These new processes, collectively known as very low pressure plasma spray or VLPPS, differ from traditional thermal spray processes in that coatings are deposited at unusually low chamber pressures, typically less than ~800 Pa (6 Torr). Depending upon the specific process, deposition may be in the form of very fine molten droplets, vapor phase deposition, or a mixture of vapor and droplet deposition. Resulting coatings are similar in q… Show more

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Cited by 68 publications
(20 citation statements)
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“…The elevated temperature at the jet core (~14,000 K) produces high proportions of particles melted and it gives rise to excellent deposition characteristics like coating density, bond strength, and less porosity compared to other thermal spraying techniques [84]. Vacuum plasma spray (VPS) coatings (<100 Pa) are developed to reduce the detrimental effects like oxidation and undesired contamination in the coatings [85]. Vacuum spray coatings offer better columnar structure and increased deposition rate compared to the conventional PVD.…”
Section: Thermal Spray Techniquesmentioning
confidence: 99%
“…The elevated temperature at the jet core (~14,000 K) produces high proportions of particles melted and it gives rise to excellent deposition characteristics like coating density, bond strength, and less porosity compared to other thermal spraying techniques [84]. Vacuum plasma spray (VPS) coatings (<100 Pa) are developed to reduce the detrimental effects like oxidation and undesired contamination in the coatings [85]. Vacuum spray coatings offer better columnar structure and increased deposition rate compared to the conventional PVD.…”
Section: Thermal Spray Techniquesmentioning
confidence: 99%
“…This requirement has led to the development of innovative plasma coating processes for producing coatings with grain size in the nanometer range while keeping the high deposition rate and flexibility of plasma spraying [27,28]. The process uses the basic equipment of the conventional plasma spray process but the feedstock is a liquid suspension or a solution of chemical precursors instead of the conventional powder feedstock, which takes advantage of the high enthalpy content of the plasma jet to evaporate the spray material and then forms a coating by fine droplets and/or condensation of the vaporized material on the substrate [29,30]. To form the coating with liquid precursors, these must be injected into the plasma region in smaller droplets (sprayed or atomized).…”
Section: Atmospheric Plasma Spray Micro-to-nano-sized Structuresmentioning
confidence: 99%
“…With very low pressure plasma spray, the plasma is formed in a chamber held at pressures around 100 to 600 Pa (0.75 to 4.50 Torr) [5]. Over this pressure range, the plasma jet expands to more than 20 cm in diameter and 1 m in length.…”
Section: Very Low Pressure Plasma Spray (Vlpps)mentioning
confidence: 99%