2017
DOI: 10.1021/acs.nanolett.7b02251
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Vertical InAs/InGaAs Heterostructure Metal–Oxide–Semiconductor Field-Effect Transistors on Si

Abstract: III-V compound semiconductors offer a path to continue Moore's law due to their excellent electron transport properties. One major challenge, integrating III-V's on Si, can be addressed by using vapor-liquid-solid grown vertical nanowires. InAs is an attractive material due to its superior mobility, although InAs metal-oxide-semiconductor field-effect transistors (MOSFETs) typically suffer from band-to-band tunneling caused by its narrow band gap, which increases the off-current and therefore the power consump… Show more

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Cited by 39 publications
(39 citation statements)
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“…However, to further improve the margin for the required high voltage tolerance of the transistor, it is possible to change the composition of the nanowire on the drain side to InGaAs, where VNW‐FETs withstanding a drain–source voltage ( V DS ) of 1.5 V at multiple gate‐source voltage ( V GS ) points without degradation are demonstrated for a d NW of 28 nm. [ 26 ] According to the oxide thickness trend in Figure 3a, scaling the switching oxide would also reduce the required voltage during forming. To maintain an achievable 100x R HRS / R LRS ‐ratio, it can be estimated that a 1.7 nm HfO 2 thickness is needed.…”
Section: Figurementioning
confidence: 99%
“…However, to further improve the margin for the required high voltage tolerance of the transistor, it is possible to change the composition of the nanowire on the drain side to InGaAs, where VNW‐FETs withstanding a drain–source voltage ( V DS ) of 1.5 V at multiple gate‐source voltage ( V GS ) points without degradation are demonstrated for a d NW of 28 nm. [ 26 ] According to the oxide thickness trend in Figure 3a, scaling the switching oxide would also reduce the required voltage during forming. To maintain an achievable 100x R HRS / R LRS ‐ratio, it can be estimated that a 1.7 nm HfO 2 thickness is needed.…”
Section: Figurementioning
confidence: 99%
“…A schematic of the device structure is provided in Fig. 1(a) and details about the processing can be found in [14]. Fig.…”
Section: Devices and Measurement Setupmentioning
confidence: 99%
“…Semiconductor nanowires (NWs) are promising building blocks for future devices like transistors, 1,2 light-emitting diodes (LEDs), 3 lasers, 4 solar cells 5,6 or sensors. 7,8 The synthesis of semiconductor NWs is often realized by the vapourliquid-solid (VLS) growth, which involves a liquid metal droplet on top of the growing NWs.…”
Section: Introductionmentioning
confidence: 99%