The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report presents the theoretical formulation and describes the design, methods, and results of tests performed to verify our ability to measure on-wafer noise temperature. With known off-wafer noise sources, several different configurations were used to obtain different, known, onwafer noise temperatures. These were then measured, and the results were compared to predictions. Good agreement was found, with a worst-case disagreement of 2.6 percent. An uncertainty analysis of the measurements resulted in an estimated standard uncertainty (la) of 1.1 percent or less for most values of noise temperature. The tests also confirm our ability to produce known noise temperatures on wafer.