2011 IEEE/ACM International Symposium on Nanoscale Architectures 2011
DOI: 10.1109/nanoarch.2011.5941482
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Variation-tolerant ultra low-power heterojunction tunnel FET SRAM design

Abstract: Abstract-Steep sub-threshold Interband Tunnel FETs (TFETs) are promising candidates for low supply voltage applications with higher switching performance than traditional CMOS. Unlike CMOS, TFETs exhibit uni-directional conduction due to their asymmetric source-drain architecture, and delayed output saturation characteristics. These unconventional characteristics of TFETs pose a challenge for providing good read/write noise margin characteristics in TFET SRAMs. We provide an analysis of 8T and 10T TFET SRAM ce… Show more

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Cited by 119 publications
(80 citation statements)
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References 19 publications
(29 reference statements)
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“…Both currentvoltage (I-V) and capacitance-voltage (C-V) characteristics were obtained from the TCAD Sentaurus device simulator by the NDCL group at PSU [6][7]12]. The Verilog-A model describes the behavior of a 40 nm double gate GaSb-InAs TFET device calibrated through full-band atomistic simulations with a dynamic non-local band-to-band tunneling model.…”
Section: Tfet-based Charge-pumpsmentioning
confidence: 99%
See 1 more Smart Citation
“…Both currentvoltage (I-V) and capacitance-voltage (C-V) characteristics were obtained from the TCAD Sentaurus device simulator by the NDCL group at PSU [6][7]12]. The Verilog-A model describes the behavior of a 40 nm double gate GaSb-InAs TFET device calibrated through full-band atomistic simulations with a dynamic non-local band-to-band tunneling model.…”
Section: Tfet-based Charge-pumpsmentioning
confidence: 99%
“…HE emerging Tunnel Field-Effect Transistor (TFET) has been considered an attractive alternative to replace conventional CMOS technologies in ultra-low power and energy efficient computing applications [1][2][3][4][5][6][7]. In contrast to thermionic devices, the high energy filtering of the band -toband tunneling (BTBT) carrier injection mechanism characterizes the TFET device with a sub-threshold slope (SS) below 60 mV/dec (at room temperature) and lower leakage current.…”
Section: Introductionmentioning
confidence: 99%
“…5 for the biasing condition V GS =2V DS . The simulation results of the TFET device are based on heterojunction structure with III-V materials [9][10]. As expressed in (1) the use of materials with low energy band gap materials can increase the BTBT probability of the TFET device, thus increasing the tunneling current at similar voltage values compared to the use of higher energy band gap materials as silicon.…”
Section: Tfet In Energy Harvesting Passive Rectifiersmentioning
confidence: 99%
“…6 is presented. Both rectifiers are simulated with GaSb-InAs Tunnel FET devices [9][10] (characteristics presented in Fig. 5).…”
Section: B Second Region Of Operation (Rf -> Rf + )mentioning
confidence: 99%
“…Recently, many different TFET SRAMs have been explored to overcome this limitation [14][15][16][17]. By comparing those designs on several aspects (e.g.…”
Section: 2tunneling Field Effect Transistors (Tfets)mentioning
confidence: 99%