2012
DOI: 10.1016/j.jnoncrysol.2011.12.091
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Variation of the defect density in a-Si:H and μc-Si:H based solar cells with 2 MeV electron bombardment

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Cited by 5 publications
(6 citation statements)
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“…In our previous work, 9,10 we have shown that 2 MeV electron bombardment combined with stepwise annealing may be used to vary the defect density of the absorber layer in p-side illuminated thin film solar cells over several orders of magnitude in a particular device, which, in the case of lc-Si:H, is not achievable with light-soaking. The here applied high energy electron bombardment at low temperatures leads to a spatially homogeneous increase in the defect density.…”
mentioning
confidence: 99%
“…In our previous work, 9,10 we have shown that 2 MeV electron bombardment combined with stepwise annealing may be used to vary the defect density of the absorber layer in p-side illuminated thin film solar cells over several orders of magnitude in a particular device, which, in the case of lc-Si:H, is not achievable with light-soaking. The here applied high energy electron bombardment at low temperatures leads to a spatially homogeneous increase in the defect density.…”
mentioning
confidence: 99%
“…Both the solar cells and ESR samples underwent identical 2 MeV electron bombardment with fluence of 9.4 × 10 16 e/cm 2 at approximately 100 K, and subsequent stepwise annealing as described in our previous publications [8][9][10][11]16]. In the following discussion the spin density, N S , measured in the reference samples, is referred to as the defect density in the absorber layer.…”
Section: Methodsmentioning
confidence: 99%
“…The electron bombardment creates defects in every layer of the solar cell stack including glass substrate. Nevertheless, we expect that the photovoltaic performance is predominantly determined by the increase in the defect density of absorber layer rather than other functional layers of a cell [9][10][11].…”
Section: Methodsmentioning
confidence: 99%
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