Vapour-phase deposition of two-dimensional layered chalcogenides

A Mini Review: Phase Regulation for Molybdenum Dichalcogenide Nanomaterials

“…CVD is an efficient and ideal means to prepare large-area, high-quality TMDC nanomaterials [ 59 , 60 ]. By using the CVD method, not only the morphology but also the phase structure of TMDC nanomaterials can be regulated [ 61 , 62 ].…”

Metalloid-doping in SMoSe Janus layers: first-principles study on efficient catalysts for the hydrogen evolution reaction

“…Recently, extensive theoretical and limited experimental studies have reported the photocatalytic activity of many JLs of various transition metal dichalcogenides. 1,32,43–51 Due to the challenges in synthetic processes, to date, only SMoSe, 32,44,49,52,53 SWSe 49 and SPtSe 54 JLs have been experimentally realized, using chemical vapor deposition followed by sulfurization or pulsed laser deposition of Se. In particular, for the first time, the model representative of JLs, SMoSe, was experimentally realized from an MoS 2 precursor by Lu et al 52 and from MoSe 2 by Zhang et al 32 Since then, SMoSe has attracted more attention.…”

Boosting Monolayer Transition Metal Dichalcogenides Growth by Hydrogen-Free Ramping during Chemical Vapor Deposition

“…The flakes grown from the solution with only the AMT precursor are denoted as “AMT only”, while the flakes grown with various salt promoters are denoted as “With KI”, “With KOH”, and “With NaCl”, respectively. According to previous results, NaCl and KI promote the growth of 2D TMDs by forming volatile oxyhalides to enhance the vapor pressure of metal precursors, relaxing the in-plane strain to facilitate 2D in-plane growth and reducing the reaction energy barrier. , For the usage of the KOH promoter, the generated hydroxyl (−OH) groups have been reported to selectively attach to the (001) surface of TMDs, suppressing the nucleation of multilayers and promoting the lateral growth of monolayer TMDs. , Besides, −OH groups are potentially beneficial for reducing the density of defects, such as chalcogen vacancies, in synthesized 2D TMDs Figure a shows the comparison of MoSe 2 flakes grown with (first row) and without (second row) H 2 during the ramping step.…”

“…According to previous results, NaCl and KI promote the growth of 2D TMDs by forming volatile oxyhalides to enhance the vapor pressure of metal precursors, relaxing the in-plane strain to facilitate 2D inplane growth and reducing the reaction energy barrier. 30,31 For the usage of the KOH promoter, the generated hydroxyl (−OH) groups have been reported to selectively attach to the (001) surface of TMDs, suppressing the nucleation of multilayers and promoting the lateral growth of monolayer TMDs. 32,33 Besides, −OH groups are potentially beneficial for reducing the density of defects, such as chalcogen vacancies, in synthesized 2D TMDs.…”