Vapor phase preparation and properties of NbN/C(carbon coils)/NbN–NbN micro-coils/micro-tubes

NbN/W2N nano-multilayer films with a modulation periodicity, Λ, ranging from 5.1 to 157.4 nm have been deposited on a Si(100) substrate by reactive magnetron sputtering in Ar/N2 mixtures. The Λ dependent structural and mechanical properties for the resulting NbN/W2N multilayers have been evaluated by means of low-angle x-ray reflectivity, x-ray diffraction, high-resolution transmission electron microscope, and nanoindentation measurements. The finding is that for films with Λ ≤ 10.6 nm, fcc NbN layers are coherent with cubic W2N layers, resulting in NbN layers and W2N layers that are in the compressive and tensile states, respectively. In contrast, as Λ is larger than 10.6 nm, a phase transition from W2N to W occurs in the W2N layer, which is a result of the coherent interface strain relaxation. For this case, all layers are in the compressive state, and the coherent interface disappears. The intrinsic compressive stress evolution with Λ can be interpreted in terms of interface stress. The formation of coherent interface at small Λ (≤10.6 nm) is helpful for releasing point defects in layers, leading to a low compressive stress (≤1.1 GPa). The hardness for the obtained multilayer film increases with decreasing Λ, and approaches a maximum value of 43.7 GPa when Λ is 7.4 nm. The maximum strengthen at lower Λ is mainly attributed to coherent interface stresses and the modulus difference between the NbN and W2N layers. The increase in hardness with a decrease in Λ is interpreted by the Lehoczky model.

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Vapor phase preparation and properties of NbN/C(carbon coils)/NbN–NbN micro-coils/micro-tubes

Cited by 2 publications

References 11 publications

Growth, stress and hardness of reactively sputtered tungsten nitride thin films

Growth, stress and hardness of reactively sputtered tungsten nitride thin films

Modulation periodicity dependent structure, stress, and hardness in NbN/W2N nanostructured multilayer films

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