Vapor-Phase Chemical Functionalization of High Porosity, Nanostructured Thin Films

Abstract

Trifluoropropyl-trichlorosilane reagents were used to tailor the surface chemistry of porous nano-structured thin films fabricated using glancing angle deposition (GLAD). GLAD produces high surface area films of isolated columnar structures and provides complete control over the film morphology. Here, the chemical tunability of these GLAD films was investigated using solution and vapor-phase surface functionalization methods. All films were characterized using scanning electron microscopy, X-ray photoelectron spectroscopy and advancing aqueous contact angle measurements. Our results indicate that the surface chemistry of the GLAD films was effectively changed after functionalization by either approaches. We also note that vapor-phase functionalization provides more consistent results and eliminates the need for organic solvents, making it an ideal method for tailoring the surface properties of GLAD films for specific applications.