Vapor Deposition Polymerization and Electrical Characterization of TPD Thin Films

Muroyama, Masakazu; Tajiri, Ayako; Ichida, Kyoko; Yokokura, Seiji; Tanaka, Kuniaki; Otsuki, Eiji; Usui, Hiroaki

doi:10.1587/transele.e94.c.157

Cited by 10 publications

(8 citation statements)

References 14 publications

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“…Amorphization of films is considered to come from the increase in free volume as a consequence of polymerization. Such a phenomenon had also been observed with the EAD polymerization of various materials including vinyl‐substituted triphenyldiamine, [ 40 ] a naphthalenediimide derivative, [ 41,42 ] and a silsesquioxane derivative. [ 43 ]…”

Section: Resultsmentioning

confidence: 70%

Vapor Deposition of p‐Hexadecylstyrene by Ion‐ and Electron‐Assisted Methods

Sasaki

Ohyama

Kitazawa

et al. 2023

Physica Status Solidi (a)

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Thin films of p‐hexadecylstyrene (C16Sty) are prepared by an ion‐assisted deposition (IAD) and an electron‐assisted deposition (EAD) methods. The IAD enhances polymerization of C16Sty molecules by irradiating argon ions on the substrate surface, while the EAD initiates radical polymerization by irradiating electrons to the C16Sty vapor. The polymerization by these methods renders the films to be amorphous, whereas the conventional vapor deposition produces polycrystalline films consisting of C16Sty monomers. Upon thermal stress, the amorphous polymer films by IAD and EAD undergo morphological change at temperatures lower than that observed for the vapor‐deposited polycrystalline film. However, the polymer films retain smooth structure without coagulation upon heating. The deposited films have surface energy lower than that of polyethylene. Especially, the films deposited by EAD have a surface energy comparable to that of a normal alkane. The IAD and EAD of C16Sty are promising methods for preparing inert surfaces by dry processes.

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Section: Resultsmentioning

confidence: 70%

Vapor Deposition of p‐Hexadecylstyrene by Ion‐ and Electron‐Assisted Methods

Sasaki

Ohyama

Kitazawa

et al. 2023

Physica Status Solidi (a)

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“…38) Similar decrease of current accompanied by vapor deposition polymerization was found for a film of triphenylamine derivative. 39) As was revealed by the X-ray diffraction shown in Fig. 4, the polymerization renders the film to take an amorphous structure, which generally includes free volume and disorder in molecular packing.…”

Section: Electrical Propertiesmentioning

confidence: 92%

Electron-assisted deposition and interface control of naphthalenediimide derivative thin films

Izumi

Kuratomi

Usui

et al. 2022

Jpn. J. Appl. Phys.

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Stable film formation and interface control of electron-transporting polymers are important key issues for developing organic devices. In this report, thin films of N,N'-bis(p-vinylbenzyl)naphthalenediimide (PVB-NDI) were prepared by the vapor deposition and an electron-assisted (e-assist) deposition methods on aluminum substrates. The aluminum surface was modified with self-assembled monolayers (SAMs) of (3-mercaptoprppyl) trimethoxysilane (MPTMS) or vinyltriethoxysilane (VTES) for controlling the film/substrate interface. It was observed that the e-assist deposition can polymerize PVB-NDI in the process of film deposition. The polymerization was induced by the e-assist process, and was not influenced by the surface modification with the SAMs. It was found that the electron injection barrier height can be substantially decreased when the PVB-NDI film was prepared by the e-assist deposition on the aluminum surface modified with the SAM of MPTMS. It is considered that covalent tethering via the thiol-en reaction at the interface contributes to control the metal/organic interface.

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“…. N,N

0true^{'}

‐diphenyl‐N,N

0true^{'}

‐bis(4‐vinylphenyl)benzidine (DvTPD) was deposited on a tin‐doped indium oxide (TIO) substrate in a vacuum of 6

0true \times

0true^{- 4}

Pa, after which a 30‐nm thick polymer film was formed by heating in a vacuum at 200

0true^{\circ}

C for 2 h . The resulting DvTPD polymer film was insoluble in tetrahydrofuran (THF), and not only acted as a hole transport layer but was also helpful in improving the morphology of the organic layers formed on its surface.…”

Section: Methodsmentioning

confidence: 99%

Preparation of Phosphorescent Polymer Patterns by Spin‐Coating Photoreactive Small Molecules

Miyagawa

Muroyama

Tanaka

et al. 2016

Elect Comm in Japan

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SUMMARY Patterned polymer thin films were prepared by spin‐coating a solution consisting of an acryl monomer of 2‐(9H‐carbazol‐9‐yl)ethylmethacrylate, a photoinitiator of 4‐(dimethylamino)benzophenone, and a phosphorescent dopant of iridium(III) bis(2‐phenylpyridinate(4‐vinylphenylpyridine)). The film was exposed to ultraviolet (UV) light through a photomask and rinsed with an organic solvent to develop a patterned polymer thin film. A mixture of tetrahydrofuran and 1,4‐dioxane was used as the spin‐coating solvent, and ethanol was used as the developing solution. The effects of solvent, exposure time, UV intensity, and the phosphorescent dopant were examined to optimize the patterning condition. The patterned film was utilized as an emissive layer to construct an organic light‐emitting diode.

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Vapor Deposition Polymerization and Electrical Characterization of TPD Thin Films

Cited by 10 publications

References 14 publications

Vapor Deposition of p‐Hexadecylstyrene by Ion‐ and Electron‐Assisted Methods

Vapor Deposition of p‐Hexadecylstyrene by Ion‐ and Electron‐Assisted Methods

Electron-assisted deposition and interface control of naphthalenediimide derivative thin films

Preparation of Phosphorescent Polymer Patterns by Spin‐Coating Photoreactive Small Molecules

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