Vanadium pentoxide thin films deposited by the thermionic vacuum arc plasma

Durmuş, Çağrı; Akan, Tamer

doi:10.1016/j.tsf.2023.139764

Cited by 3 publications

(2 citation statements)

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“…Therefore, thin film deposition occurs under high purity conditions [22]. Multicomponent thin films and single thin films were deposited using the Thermionic Vacuum Arc (TVA) method [23][24][25][26][27]. During Briefly, TVA consists of a tungsten-heated cathode surrounded by a Wehnelt cylinder that concentrates the electron beam on the anode material.…”

Section: The Ltva Systemmentioning

confidence: 99%

“…Therefore, thin film deposition occurs under high purity conditions [22]. Multicomponent thin films and single thin films were deposited using the Thermionic Vacuum Arc (TVA) method [23][24][25][26][27]. During the last decades, this technology has been successfully used for the synthesis of a large range of metals, oxides, refractory materials, and complex composites [28][29][30][31].…”

Section: The Ltva Systemmentioning

confidence: 99%

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Microstructural and Morphological Characterization of the Cobalt-Nickel Thin Films Deposited by the Laser-Induced Thermionic Vacuum Arc Method

et al. 2023

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Laser Induced-Thermionic Vacuum Arc (LTVA) technology was used for depositing uniform intermetallic CoNi thin films of 100 nm thickness. LTVA is an original deposition method using a combination of the typical Thermionic Vacuum Arc (TVA) system and a laser beam provided by a QUANTEL Q-Smart 850 Nd:YAG compact Q-switched laser with a second harmonic module. The novelty is related to the simultaneous deposition of a bi-component metallic thin film using photonic processes of the laser over the plasma deposition, which improves the roughness but also triggers the composition of the deposited thin film. Structural analysis of the deposited thin films confirms the formation of face-centered cubic (fcc) as the main phase CoNi and hexagonal Co3Ni as the minority phase, observed mainly using high-resolution transmission electron microscopy. The magneto-optical measurements suggest an isotropic distribution of the CoNi alloy thin films for the in-plan angular rotation. From the low coercive field of Hc = 40 Oe and a saturation field at 900 Oe, the CoNi thin films obtained by LTVA are considered semi-hard magnetic materials. Magnetic force microscopy reveals spherical magnetic nanoparticles with mean size of about 40–50 nm. The resistivity was estimated at ρ = 34.16 μΩ cm, which is higher than the values for bulk Co and Ni.

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Section: The Ltva Systemmentioning

confidence: 99%

“…Therefore, thin film deposition occurs under high purity conditions [22]. Multicomponent thin films and single thin films were deposited using the Thermionic Vacuum Arc (TVA) method [23][24][25][26][27]. During the last decades, this technology has been successfully used for the synthesis of a large range of metals, oxides, refractory materials, and complex composites [28][29][30][31].…”

Section: The Ltva Systemmentioning

confidence: 99%