Vacuum ultraviolet driven chemical vapor deposition of localized aluminum thin films

Calloway, A. R.; Galantowicz, T. A.; Fenner, W. R.

doi:10.1116/1.571925

Cited by 33 publications

(9 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…570 For strictly BEOL applications, photo-assisted depositions of both metals and low- dielectrics have been explored over the past two decades. Specifically, photo-assisted CVD 497,571 and ALD 572,573 of important interconnect metals such as Al, 574,575 W, 576 and Cu 513 and photo-assisted electroplating (EP) of Cu 577 have been reported. In some cases, selective are photo-CVD processes have also been reported for Al, Cu, and W. 578 However, neither photoassised CVD or EP have yet to supplant the current PVD, CVD, and EP methods utilized to deposit these metals in BEOL interconnect fabrication.…”

Section: V32 Uv-assisted Film Depositionmentioning

confidence: 99%

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Baklanov

Jousseaume

Рахимова

et al. 2019

Applied Physics Reviews

View full text Add to dashboard Cite

This paper presents an in-depth overview of the application and impact of UV/VUV light in advanced interconnect technology. UV light application in BEOL historically was mainly motivated by the need to remove organic porogen and generate porosity in organosilicate (OSG) low-k films. Porosity lowered the film's dielectric constant, k, which enables one to reduce the interconnect wiring capacitance contribution to the RC signal delay in integrated circuits. The UV-based low-k film curing (λ > 200 nm) proved superior to thermal annealing and electron beam curing. UV and VUV light also play a significant role in plasma-induced damage to pSiCOH. VUV light with λ < 190–200 nm is able to break Si-CH3 bonds and to make low-k materials hydrophilic. The following moisture adsorption degrades the low-k properties and reliability. This fact motivated research into the mechanisms of UV/VUV photon interactions in pSiCOH films and in other materials used in BEOL nanofabrication. Today, the mechanisms of UV/VUV photon interactions with pSiCOH and other films used in interconnect fabrication are fairly well understood after nearly two decades of research. This understanding has allowed engineers to both control the damaging effects of photons and utilize the UV light for material engineering and nanofabrication processes. Some UV-based technological solutions, such as low-k curing and UV-induced stress engineering, have already been widely adopted for high volume manufacturing. Nevertheless, the challenges in nanoscaling technology may promote more widespread adoption of photon-assisted processing. We hope that fundamental insights and prospected applications described in this article will help the reader to find the optimal way in this wide and rapidly developing technology area.

show abstract

Section: V32 Uv-assisted Film Depositionmentioning

confidence: 99%

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Baklanov

Jousseaume

Рахимова

et al. 2019

Applied Physics Reviews

View full text Add to dashboard Cite

show abstract

“…Also shown in Figure 6 are calculated rates, for several species (M = Ar, H2, C02, CH4). Relaxation by He was not calculated since it is less efficient as a quencher than H2.31 Self-relaxation by CO CO(f) + CO(O) -> CO(u-l) + CO(O) (16) is not efficient under the present conditions.20•28 For C02 and CH4 the processes considered were V-V transfer, specifically CO(u) + C02(000) -* CO(u-l) + CO2(100)…”

Section: Discussionmentioning

confidence: 99%

Transfer and storage of vibrational energy in liquids: collisional up-pumping of carbon monoxide in liquid argon

Anex¹,

Ewing²

1986

J. Phys. Chem.

View full text Add to dashboard Cite

“…There are no Al(CH 3 ) + ions present because the energy of the UV light generated by the D 2 arc lamp is insufficient to ionize TMA (ionization energy ≈ 9 eV). 32,39 To investigate the dependence of the Al film growth on the UV photolysis of TMA, the following experiment was performed. Carboxylic acid-terminated SAMs were exposed to 1500 L TMA under UV irradiation at TMA pressures from 5 × 10 −7 Torr to 1 × 10 −5 Torr.…”

Section: Effect Of Uv Exposure On Sam Chemistry While Uv Photolysis O...mentioning

confidence: 99%

UV Photoactivated Room Temperature CVD of Aluminum on Functionalized Self-Assembled Monolayers Adsorbed on Au

Shi

Walker

2012

Langmuir

View full text Add to dashboard Cite

We have investigated the selective photoactivated room temperature chemical vapor deposition (CVD) of aluminum (Al) on functionalized self-assembled monolayers adsorbed on Au. The CVD precursor employed is trimethyl aluminum (TMA). Using a deuterium arc lamp we demonstrate that the rate of the Al film growth is approximately twice that observed for nonphotoactivated Al chemical vapor deposition (CVD) using TMA. At the wavelengths employed, the photolysis of TMA leads to the dissociation of the TMA dimer to its monomer followed by successive release of methyl groups to form (CH(3))(3-x)Al. The photogenerated (CH(3))(3-x)Al species react with -OH- and -COOH-terminated SAMs but not -CH(3)-terminated SAMs. Using these reactions we demonstrate that aluminum can be selectively deposited on -CH(3)/-COOH-patterned SAMs. The possible reaction mechanisms involved in the Al film growth are discussed. These results indicate that photoactivated CVD (laser CVD) processes are suitable for the deposition of stable films of metals and other materials on organic films.

show abstract

Vacuum ultraviolet driven chemical vapor deposition of localized aluminum thin films

Cited by 33 publications

References 0 publications

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

Transfer and storage of vibrational energy in liquids: collisional up-pumping of carbon monoxide in liquid argon

UV Photoactivated Room Temperature CVD of Aluminum on Functionalized Self-Assembled Monolayers Adsorbed on Au

Contact Info

Product

Resources

About