2008
DOI: 10.1103/physrevlett.101.116101
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Vacancy Formation and Strain in Low-TemperatureCu/Cu(100)Growth

Abstract: The development of compressive strain in metal thin films grown at low temperature has recently been revealed via x-ray diffraction and explained by the assumption that a large number of vacancies were incorporated into the growing films. The results of our molecular dynamics and parallel temperature-accelerated dynamics simulations suggest that the experimentally observed strain arises from an increased nanoscale surface roughness caused by the suppression of thermally activated events at low temperature comb… Show more

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Cited by 29 publications
(31 citation statements)
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“…15͒ thin films grown at temperatures between 110 to 300 K have provided evidence for a surprisingly high vacancy concentration incorporated in deposited thin films. Subsequent molecular-dynamics simulations demonstrated 16 kinetic channels that allow the formation of vacancies or voids in the growing film. Furthermore, low concentration of extremely mobile surface vacancies assist the self-diffusion ͑homoepitaxy͒ of Cu islands on Cu͑001͒ ͑Ref.…”
Section: Introductionmentioning
confidence: 99%
“…15͒ thin films grown at temperatures between 110 to 300 K have provided evidence for a surprisingly high vacancy concentration incorporated in deposited thin films. Subsequent molecular-dynamics simulations demonstrated 16 kinetic channels that allow the formation of vacancies or voids in the growing film. Furthermore, low concentration of extremely mobile surface vacancies assist the self-diffusion ͑homoepitaxy͒ of Cu islands on Cu͑001͒ ͑Ref.…”
Section: Introductionmentioning
confidence: 99%
“…Simulation studies of relatively thin films deposited at grazing angles suggest the development of nanoscale roughness that leads to surface strains. 10 However, a connection between those simulations and the present work is difficult to make because our films were quite thick (100 ML) and they were deposited at near-normal (30 degrees). Future experiments on thinner films and performed as a function of deposition angle are required in order to explore the effect of nanoscale surface roughness effects.…”
Section: Discussionmentioning
confidence: 76%
“…The reentrant roughening was reproduced in KMC simulations by relaxing the funneling condition which introduced internal voids or vacancy clusters, thereby, giving theoretical support for the presence of such incorporated defects 9 . An alternative explanation was later suggested by Shim et al 10 whose accelerated molecular dynamics (MD) simulations reported that large off-normal deposition angles cause nanoscale surface roughness which, in turn, leads to compressive strain comparable in size to that observed in the x-ray reflectivity studies . However, x-ray diffuse scattering experiments by Kim et al, performed for 100 monolayer (ML) Ag(001) homoepitaxial films grown at a considerably smaller off-normal deposition angle, revealed point-defect scattering that provides clear experimental evidence for the existence of large vacancy clusters 11 .…”
mentioning
confidence: 92%
“…However, the deposition process usually incorporates downward funneling (DF) of atoms deposited at step edges to adsorption sites in lower layers [4,5]. There may also be steering towards any steep sides of multilayer nanoprotrusions [6,7] or shadowing for oblique incidence [8].…”
Section: Introductionmentioning
confidence: 99%