V2O5 Thin Films Deposited by RF Magnetron Sputtering: The Influence of Oxygen Content in Physical Properties

Abstract

Vanadium Oxide thin films were deposited by RF Magnetron sputtering using a V 2 O 5 target on glass and on FTO/Glass substrates without O 2 and with a O 2 atmosphere in the deposition chamber respectively. The effects of O 2 on compositional, structural, electrical and optical properties has been studied using, EDS (Energy dispersive spectroscopy), XRD (X-rays diffraction), Scanning and Transmission Electron Microscopy (SEM) and (TEM) respectively, UV and Visible Spectroscopy and the Four Points method to study electric surface properties. Abrupt variations in electrical resistivity as the films were heated around 255 ºC suggest a change of phase from semiconductor to a metallic material. The β-V 2 O 5 films present electrochromic behavior under an external voltage, but Cyclic Voltammetry experiments reveal poor durabilitty of electrochromic properties.